Computational enablement for designs with sub-20nm metal tip to tip using cut shapes from grapho-epitaxy directed self-assembly

Balint Meliorisz; Kafai Lai; Ulrich Welling; Hans-Jürgen Stock; Sajan Marokkey; Thomas Muelders; Jing Sha; Chi-chun Liu; Cheng Chi; Jing Guo; Clifford Osborn; Jaime Morillo; Wolfgang Demmerle; Derren Dunn

doi:10.1117/12.2297344

6 September 2018 Computational enablement for designs with sub-20nm metal tip to tip using cut shapes from grapho-epitaxy directed self-assembly

Balint Meliorisz, Kafai Lai, Ulrich Welling, Hans-Jürgen Stock, Sajan Marokkey, Thomas Muelders, Jing Sha, Chi-chun Liu, Cheng Chi, Jing Guo, Clifford Osborn, Jaime Morillo, Wolfgang Demmerle, Derren Dunn

Author Affiliations +

Proceedings Volume 10586, Advances in Patterning Materials and Processes XXXV; 105860R (2018) https://doi.org/10.1117/12.2297344
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

This paper presents a design and technology co-optimization (DTCO) study of metal cut formation in the sub-20-nmregime. We propose to form the cuts by applying grapho-epitaxial directed self-assembly. The construction of a DTCO flow is explained and results of a process variation analysis are presented. We examined two different DSA models and evaluated their performance and speed tradeoff. The applicability of each model type in DTCO is discussed and categorized.

Citation Download Citation

Balint Meliorisz, Kafai Lai, Ulrich Welling, Hans-Jürgen Stock, Sajan Marokkey, Thomas Muelders, Jing Sha, Chi-chun Liu, Cheng Chi, Jing Guo, Clifford Osborn, Jaime Morillo, Wolfgang Demmerle, and Derren Dunn "Computational enablement for designs with sub-20nm metal tip to tip using cut shapes from grapho-epitaxy directed self-assembly", Proc. SPIE 10586, Advances in Patterning Materials and Processes XXXV, 105860R (6 September 2018); https://doi.org/10.1117/12.2297344

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