Formation of ultrahard metal oxide nanocluster coatings at room temperature by electrostatic self-assembly

Aprillya Rosidian; Yanjing Liu; Richard O. Claus

doi:10.1117/12.352784

12 July 1999 Formation of ultrahard metal oxide nanocluster coatings at room temperature by electrostatic self-assembly

Aprillya Rosidian, Yanjing Liu, Richard O. Claus

Proceedings Volume 3675, Smart Structures and Materials 1999: Smart Materials Technologies; (1999) https://doi.org/10.1117/12.352784
Event: 1999 Symposium on Smart Structures and Materials, 1999, Newport Beach, CA, United States

Abstract

Different structures of multilayer hard coating thin-films have been fabricated on single crystal silicon and quartz substrates at room temperature by electrostatic self- assembly (ESA) method. This process involves the alternate dipping of oppositely charged polyelectrolytes. The ESA films have shown the formation of highly ordered and homogeneous structures with reduced voids. UV/VIs spectroscopy and ellipsometry were used to observe the ESA deposition process. The hardness and Young's modulus of the films were measured using nanoindentation technique.

Citation Download Citation

Aprillya Rosidian, Yanjing Liu, and Richard O. Claus "Formation of ultrahard metal oxide nanocluster coatings at room temperature by electrostatic self-assembly", Proc. SPIE 3675, Smart Structures and Materials 1999: Smart Materials Technologies, (12 July 1999); https://doi.org/10.1117/12.352784

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