CONFERENCE PROCEEDINGS
Advanced Search
Home > eBooks > Field Guide to Optical Lithography > NILS: Exposure Optimization
Ebook Topic:
NILS: Exposure Optimization
Book: Field Guide to Optical Lithography
Author(s): Chris A. Mack
Published: 2006
https://doi.org/10.1117/3.665802.p56
Author Affiliations +
Abstract
This excerpt gives a succinct explanation of NILS: Exposure Optimization.
Online access to SPIE eBooks is limited to subscribing institutions.
TOPIC
DOWNLOAD PDF SAVE TO MY LIBRARY
Buy this book on SPIE.org
Buy this book on SPIE.orgBuy this book on SPIE.org
Lens.org Logo
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Image quality
Nanoimprint lithography
Image processing
Chemically amplified resists
Optical lithography
Optical properties
Photoresist processing
Subscribe to Digital Library
Receive Email Alerts on Newly Released Titles
Back to Top