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Phase-Shift Masks: Attenuated
Book: Field Guide to Optical Lithography
Author(s): Chris A. Mack
Published: 2006
https://doi.org/10.1117/3.665802.p80
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This excerpt gives a succinct explanation of Phase-Shift Masks: Attenuated.
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KEYWORDS
Photomasks
Optical proximity correction
Transmittance
Lithography
Design for manufacturability
Glasses
Manufacturing
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