CONFERENCE PROCEEDINGS
Advanced Search
Home > eBooks > Field Guide to Optical Lithography > Diffusion in Chemically Amplified Resists
Ebook Topic:
Diffusion in Chemically Amplified Resists
Book: Field Guide to Optical Lithography
Author(s): Chris A. Mack
Published: 2006
https://doi.org/10.1117/3.665802.p46
Author Affiliations +
Abstract
This excerpt gives a succinct explanation of Diffusion in Chemically Amplified Resists.
Online access to SPIE eBooks is limited to subscribing institutions.
TOPIC
DOWNLOAD PDF SAVE TO MY LIBRARY
Buy this book on SPIE.org
Buy this book on SPIE.orgBuy this book on SPIE.org
Lens.org Logo
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Diffusion
Chemically amplified resists
Glasses
Optical lithography
Photoresist materials
Polymer thin films
Polymers
Subscribe to Digital Library
Receive Email Alerts on Newly Released Titles
Back to Top