Lithography Process Control

Author(s): Harry J. Levinson

Published: 1999

PDF ISBN: 9780819478559 | Print ISBN: 9780819430526

DESCRIPTION

This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.

Buy this book on SPIE.org

TABLE OF CONTENTS SHOW ALL CHAPTER OUTLINES +

SAVE THIS BOOK TO YOUR LIBRARY

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Front Matter

DOWNLOAD PDF

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

CHAPTER 1.

Introduction to the Use of Statistical Process Control in Lithography

Chapter Outline +

1.1. The assumptions underlying statistical process control
1.2. The properties of statistical process controln
1.3. Situations in lithography where statistical process control cannot be applied naïvely
1.4. Non-normal distributions
1.5. Process capability

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

CHAPTER 2.

Sampling

Chapter Outline +

2.1 Choosing the proper sample size
2.2 Measurement location considerations
2.3 Correlations
2.4 Measurement frequency
2.5 Systematic sources of variation

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

CHAPTER 3.

Simple and Complex Processes

Chapter Outline +

3.1 Definitions
3.2 Why test wafers are useful
3.3 How to address complex processes in lithography
3.4 Distinguishing between layer-specific and equipment-specific effects

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

CHAPTER 4.

Linewidth Control

Chapter Outline +

4.1 Cause and effect
4.2 Independent variables
4.2.1 Exposure dose
4.2.2 Resist thickness
4.2.3 Focus
4.2.4 Bake temperatures
4.2.5 Resist development
4.2.6 Humidity
4.2.7 DUV resists — special considerations
4.2.8 Contributions from reticles
4.3 Maximizing the process window

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

CHAPTER 5.

Overlay

Chapter Outline +

5.1 Overlay models
5.2 Matching
5.3 Contributions from processing and alignment mark optimization
5.4 Addressing the problem of non-normal distributions
5.5 Outliers

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

CHAPTER 6.

Yield

Chapter Outline +

6.1 Yield monitor strategy
6.2 Yield models
6.3 Parameters which affect yield

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

CHAPTER 7.

Process Drift and Automatic Process Control

Chapter Outline +

7.1 Adjusting for process drift
7.2 The exponentially-weighted moving average
7.3 Automatic process control

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

CHAPTER 8.

Metrology

Chapter Outline +

8.1 The need for understanding the measurement process: defect detection
8.1 The need for understanding the measurement process: defect detection
8.3 Electrical linewidth measurement
8.4 Measurement error budgets
8.5 Measurement of overlay

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

CHAPTER 9.

Control of Operations

Chapter Outline +

9.1 Self-control
9.2 Documentation
9.3 ISO 9000

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

Back Matter

DOWNLOAD PDF

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.