PROCEEDINGS VOLUME 11148
SPIE PHOTOMASK TECHNOLOGY + EUV LITHOGRAPHY | 15-19 SEPTEMBER 2019
Photomask Technology 2019
Editor Affiliations +
Proceedings Volume 11148 is from: Logo
SPIE PHOTOMASK TECHNOLOGY + EUV LITHOGRAPHY
15-19 September 2019
Monterey, California, United States
Front Matter: Volume 11148
Proceedings Volume Photomask Technology 2019, 1114801 (2019) https://doi.org/10.1117/12.2555538
Plenary Session: Joint session with conferences 11147 and 11148
Proceedings Volume Photomask Technology 2019, 1114802 (2019) https://doi.org/10.1117/12.2540662
Survey
Proceedings Volume Photomask Technology 2019, 1114803 (2019) https://doi.org/10.1117/12.2536769
Mature Mask Support
Proceedings Volume Photomask Technology 2019, 1114805 (2019) https://doi.org/10.1117/12.2538347
H. Christopher Hamaker
Proceedings Volume Photomask Technology 2019, 1114806 (2019) https://doi.org/10.1117/12.2538392
Deep Learning Mask Applications
Ajay Baranwal, Mike Meyer, Thang Nguyen, Suhas Pillai, Noriaki Nakayamada, Mikael Wahlsten, Aki Fujimura, Mariusz Niewczas, Michael Pomerantsev
Proceedings Volume Photomask Technology 2019, 1114809 (2019) https://doi.org/10.1117/12.2538440
Alex Zepka, Sabrina Aliyeva, Parikshit Kulkarni, Narendra Chaudhary
Proceedings Volume Photomask Technology 2019, 111480A (2019) https://doi.org/10.1117/12.2536545
Linyong Pang, Suhas Pillai, Thang Nguyen, Mike Meyer, Ajay Baranwal, Henry Yu, Mariusz Niewczas, Ryan Pearman, Abhishek Shendre, et al.
Proceedings Volume Photomask Technology 2019, 111480B (2019) https://doi.org/10.1117/12.2538508
Proceedings Volume Photomask Technology 2019, 111480C (2019) https://doi.org/10.1117/12.2539821
Mask Writer and Mask Process Correction (MPC)
Proceedings Volume Photomask Technology 2019, 111480F (2019) https://doi.org/10.1117/12.2538411
Rachit Sharma, Ingo Bork, Kushlendra Mishra, ShiZhi Lyu, Linna Cong, Mingjing Tian, Malavika Sharma, Bhardwaj Durvasula, Nageswara Rao, et al.
Proceedings Volume Photomask Technology 2019, 111480G (2019) https://doi.org/10.1117/12.2536529
Proceedings Volume Photomask Technology 2019, 111480H (2019) https://doi.org/10.1117/12.2536745
Processing, Photoresist and NanoImprint Lithography
Proceedings Volume Photomask Technology 2019, 111480L (2019) https://doi.org/10.1117/12.2536896
Osamu Morimoto, Takehiko Iwanaga, Yukio Takabayashi, Keita Sakai, Wei Zhang, Anshuman Cherala, Se-Hyuk Im, Mario Meissl, Jin Choi
Proceedings Volume Photomask Technology 2019, 111480M (2019) https://doi.org/10.1117/12.2535912
Proceedings Volume Photomask Technology 2019, 111480N (2019) https://doi.org/10.1117/12.2536471
Proceedings Volume Photomask Technology 2019, 111480P https://doi.org/10.1117/12.2538165
Mask Data Prep (MPD) and Curvlinear Data Handling
Malavika Sharma, Bhardwaj Durvasula, Nageswara Rao, Ingo Bork, Rachit Sharma, Kushlendra Mishra, Peter Buck
Proceedings Volume Photomask Technology 2019, 111480Q (2019) https://doi.org/10.1117/12.2538646
Proceedings Volume Photomask Technology 2019, 111480S https://doi.org/10.1117/12.2539054
Proceedings Volume Photomask Technology 2019, 111480T (2019) https://doi.org/10.1117/12.2538445
Linyong Pang, Ezequiel Vidal Russell, Bill Baggenstoss, Michael Lee, Jennefir Digaum, Ming-Chuan Yang, P. Jeffrey Ungar, Ali Bouaricha, Kechang Wang, et al.
Proceedings Volume Photomask Technology 2019, 111480U (2019) https://doi.org/10.1117/12.2534629
EUV Blank and Films: Joint Session with conference 11147 and 11148
David L. Aronstein, Christopher Avery, Katherine Ballman, Christopher Lee, John Zimmerman
Proceedings Volume Photomask Technology 2019, 111480V (2019) https://doi.org/10.1117/12.2539247
EUV Defects, Inspection and Characterization: Joint Session with conferences 11147 and 11148
Proceedings Volume Photomask Technology 2019, 111480W (2019) https://doi.org/10.1117/12.2538001
Proceedings Volume Photomask Technology 2019, 111480X (2019) https://doi.org/10.1117/12.2536474
EUV Pellicle: Joint Session with conferences 11147 and 11148
Proceedings Volume Photomask Technology 2019, 111480Y (2019) https://doi.org/10.1117/12.2535396
Proceedings Volume Photomask Technology 2019, 111480Z https://doi.org/10.1117/12.2539262
Poster Session
Linna Cong, Shizhi Lyu, Mingjing Tian, Feng Liu, Min Zhang, Zexi Deng, Chunli Zhang, Ming Chen
Proceedings Volume Photomask Technology 2019, 1114810 (2019) https://doi.org/10.1117/12.2529862
Richard van Haren, Steffen Steinert, Orion Mouraille, Koen D'havé, Leon van Dijk, Jan Hermans, Dirk Beyer
Proceedings Volume Photomask Technology 2019, 1114811 (2019) https://doi.org/10.1117/12.2536270
Proceedings Volume Photomask Technology 2019, 1114812 (2019) https://doi.org/10.1117/12.2536494
Proceedings Volume Photomask Technology 2019, 1114813 (2019) https://doi.org/10.1117/12.2536495
Proceedings Volume Photomask Technology 2019, 1114814 (2019) https://doi.org/10.1117/12.2536526
Dejian Li, Fen Xue, Cong Lu, Wenjun Ling, Xuefei Qin, Jie Wang
Proceedings Volume Photomask Technology 2019, 1114816 (2019) https://doi.org/10.1117/12.2536622
Proceedings Volume Photomask Technology 2019, 1114817 (2019) https://doi.org/10.1117/12.2536624
Proceedings Volume Photomask Technology 2019, 1114818 (2019) https://doi.org/10.1117/12.2536626
Proceedings Volume Photomask Technology 2019, 111481A (2019) https://doi.org/10.1117/12.2536739
Amit Dounde, Syed Muhammad Yasser Sherazi, Ryoung-Han R. Kim, Darko Trivkovic, Werner Gillijns, Youssef Drissi
Proceedings Volume Photomask Technology 2019, 111481C (2019) https://doi.org/10.1117/12.2536899
M. Holz, C. Reuter, A. Reum, A. Ahmad, M. Hofmann, T. Ivanov, I. W. Rangelow, J. Stauffenberg, E. Manske, et al.
Proceedings Volume Photomask Technology 2019, 111481E (2019) https://doi.org/10.1117/12.2537009
Mathias Holz, Christoph Reuter, Alexander Reum, Ahmad Ahmad, Martin Hofmann, Tzvetan Ivanov, Stephan Mechold, Ivo W. Rangelow
Proceedings Volume Photomask Technology 2019, 111481F (2019) https://doi.org/10.1117/12.2537018
Ariel Shkalim, Paul Crider, Evgeny Bal, Ronen Madmon, Alexander Chereshnya, Oren Cohen, Oded Dassa, Ori Petel, Boaz Cohen
Proceedings Volume Photomask Technology 2019, 111481G (2019) https://doi.org/10.1117/12.2537511
Proceedings Volume Photomask Technology 2019, 111481H (2019) https://doi.org/10.1117/12.2537935
William Chou, Jeffrey Cheng, C. H. Twu, Adder Lee, Chih Hsuan Chao, Xin Ren Yu, Po Tsang Chen, Edgar Huang, Junjin Lin, et al.
Proceedings Volume Photomask Technology 2019, 111481I (2019) https://doi.org/10.1117/12.2537938
Proceedings Volume Photomask Technology 2019, 111481K (2019) https://doi.org/10.1117/12.2538626
Proceedings Volume Photomask Technology 2019, 111481L (2019) https://doi.org/10.1117/12.2539039
Keisuke Tsuda, Tetsuo Harada, Takeo Watanabe
Proceedings Volume Photomask Technology 2019, 111481N (2019) https://doi.org/10.1117/12.2540815
Proceedings Volume Photomask Technology 2019, 111481O (2019) https://doi.org/10.1117/12.2536788
Proceedings Volume Photomask Technology 2019, 111481P (2019) https://doi.org/10.1117/12.2537887
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