PROCEEDINGS VOLUME 11178
PHOTOMASK JAPAN 2019 | 16-18 APRIL 2019
Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
Editor(s): Akihiko Ando
Editor Affiliations +
PHOTOMASK JAPAN 2019
16-18 April 2019
Yokohama, Japan
Front Matter: Volume 11178
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 1117801 (2019) https://doi.org/10.1117/12.2541433
PMJ19 Opening Session I
Nui Chong, Xin Wu
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 1117802 (2019) https://doi.org/10.1117/12.2537628
Litho and Etching
Toshiyuki Horiuchi, Kousuke Akitani, Kazumi Imahashi, Yuta Suzuki, Jun-ya Iwasaki, Hiroshi Kobayashi, Akira Yanagida
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 1117803 (2019) https://doi.org/10.1117/12.2532442
Keisuke Kawashima, Koji Inoue, Kenichi Fujii, Takashi Oda, Kazuo Kohmura
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 1117804 (2019) https://doi.org/10.1117/12.2538082
FPD
Kouichi Murakami, Takumi Uemura, Shuichi Ojima
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 1117805 (2019) https://doi.org/10.1117/12.2533422
EUVL I
Derk Brouns, Par Broman, Jan-Willem van der Horst, Raymond Lafarre, Raymond Maas, Theo Modderman, Roel Notermans, Guido Salmaso
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 1117806 (2019) https://doi.org/10.1117/12.2536344
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 1117807 (2019) https://doi.org/10.1117/12.2538243
EDA and MDP
Alex Zepka, John Valadez, Parikshit Kulkarni, Kohei Yanagisawa, Kota Kobayashi, Kiyoshi Kageyama
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 1117808 (2019) https://doi.org/10.1117/12.2535707
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 1117809 (2019) https://doi.org/10.1117/12.2536632
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 111780A (2019) https://doi.org/10.1117/12.2538244
Special Session: MEMS & PUF
Masayoshi Esashi, Hiroshi Miyaguchi, Akira Kojima, Naokatsu Ikegami, Nobuyoshi Koshida, Masanori Sugata, Hideyuki Ohyi
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 111780B (2019) https://doi.org/10.1117/12.2532971
EUVL II
Moshe Preil, James W. Westphal
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 111780C (2019) https://doi.org/10.1117/12.2536308
Masashi Yonetani, Karen Badger, Jed Rankin, Shinji Akima, Yusuke Toda, Itaru Yoshida, Masayuki Kagawa, Takeshi Isogawa, Yutaka Kodera, et al.
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 111780D (2019) https://doi.org/10.1117/12.2537430
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 111780E (2019) https://doi.org/10.1117/12.2537734
PMJ19 Opening Session III
Vicky Philipsen, Kim Vu Luong, Karl Opsomer, Laurent Souriau, Jens Rip, Christophe Detavernier, Andreas Erdmann, Peter Evanschitzky, Christian Laubis, et al.
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 111780F (2019) https://doi.org/10.1117/12.2537967
EUVL III
Katrina Rook, Narasimhan Srinivasan, Vincent Ip, Meng Lee, Tania Henry
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 111780G (2019) https://doi.org/10.1117/12.2537992
David L. Aronstein, Katherine Ballman, Christopher Lee, John Zimmerman
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 111780H (2019) https://doi.org/10.1117/12.2537390
NIL
Toshiya Asano, Keita Sakai, Kiyohito Yamamoto, Hiromi Hiura, Takahiro Nakayama, Tomohiko Hayashi, Yukio Takabayashi, Takehiko Iwanaga, Douglas J. Resnick
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 111780I (2019) https://doi.org/10.1117/12.2532522
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 111780J (2019) https://doi.org/10.1117/12.2536315
CD and Defect Control
Tod Robinson, Jeff LeClaire
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 111780K (2019) https://doi.org/10.1117/12.2534759
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 111780L (2019) https://doi.org/10.1117/12.2534978
Poster Session: Process and Material
Yuan Hsu, Yutaka Satou, Heng-Jen Lee, Zack Huang
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 111780M (2019) https://doi.org/10.1117/12.2530983
Poster Session: EUVL Masks
Akira Ishikawa, Hirofumi Tanaka, Yosuke Ono, Atsushi Okubo, Kazuo Kohmura
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 111780N (2019) https://doi.org/10.1117/12.2533889
T. Missalla, A. Biermanns-Föth, C. Pampfer, J. Arps, C. Phiesel, C. Piel, R. Lebert
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 111780O (2019) https://doi.org/10.1117/12.2537611
Poster Session: EDA and MDP
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 111780Q (2019) https://doi.org/10.1117/12.2535770
Poster Session: Mask Overlay
Richard van Haren, Steffen Steinert, Orion Mouraille, Koen D’havé, Leon van Dijk, Jan Hermans, Dirk Beyer
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 111780R (2019) https://doi.org/10.1117/12.2535900
PMJ19 Late Paper
Ryota Seki, Akihiko Ando, Takeharu Motokawa, Machiko Suenaga, Noriko Iida nee Sakurai, Ryu Komatsu, Masato Naka, Rikiya Taniguchi, Syuichi Taniguchi, et al.
Proceedings Volume Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 111780S (2020) https://doi.org/10.1117/12.2567043
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