PROCEEDINGS VOLUME 2512
PHOTOMASK JAPAN 1995 | 20-21 APRIL 1995
Photomask and X-Ray Mask Technology II
Editor(s): Hideo Yoshihara
Editor Affiliations +
PHOTOMASK JAPAN 1995
20-21 April 1995
Kanagawa, Japan
Photomask Process and Materials
Geoffrey M. Akiki
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212757
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212768
Hideki Tarumoto, Kazuyuki Maetoko, Sakae Yamashita, Satoshi Aoyama, Hiroaki Morimoto
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212779
Hideo Kobayashi, Keishi Asakawa, Yasunori Yokoya
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212790
Gilbert V. Shelden, Anne Rudack, Rajeev R. Singh, Wayne Smith, Alvina M. Williams
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212801
Cheol Shin, Yung-Sung Son, Ki Jong Kim
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212811
Naofumi Inoue, Hiroaki Nakagawa, Masahiro Kondou, Masanari Kitajima
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212814
X-Ray Mask Metrology and Equipment
Tsutomu Shoki, Ryo Ohkubo, Gregory M. Wells, Yoichi Yamaguchi, Kuniaki Yamazaki, Franco Cerrina
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212815
Jinho Ahn, Katsumi Suzuki, Shinji Tsuboi, Yoshio Yamashita
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212758
Masaaki Ito, Takashi Soga, Hiromasa Yamanashi, Taro Ogawa
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212759
Equipment and Metrology
Eiji Matsubara, Yoshihisa Fujita, Taro Ototake
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212760
Junichiro Iba, Kohji Hashimoto, Richard A. Ferguson, Toshiaki Yanagisawa, Donald J. Samuels
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212761
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212762
Tadashi Komagata, Hitoshi Takemura, Nobuo Gotoh, Kazumitsu Tanaka
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212763
Hirohito Anze, Satoshi Yamasaki, Shuichi Tamamushi, Yoji Ogawa, Eiji Murakami, Ryoichi Hirano, Kazuto Matsuki
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212764
Photomask Process and Materials
Masumi Arai, Hiroyuki Inomata, Toshiharu Nishimura, Masa-aki Kurihara, Naoya Hayashi
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212765
Mark D. Cerio
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212766
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212767
Equipment and Metrology
Christian Ehrlich, Olaf K. Fortagne, Peter Hahmann
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212769
X-Ray Mask Metrology and Equipment
Tatsuya Kunioka, Nobuo Shimazu, Akira Shimizu, Tomoaki Sakai, Youichi Kuriyama
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212770
Shuichi Noda, Hiroshi Hoga
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212771
Masatoshi Oda, Takashi Ohkubo, Hideo Yoshihara
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212772
Shinji Tsuboi, Tsutomu Shoki, Tsuneaki Ohta, Hiroshi Okuyama, Kinya Ashikaga, Yoshio Yamashita, Ryo Ohkubo, Yoichi Yamaguchi, Hiroshi Hoga
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212773
Gregory M. Wells, Michael T. Reilly, Frederick T. Moore, Franco Cerrina, Kuniaki Yamazaki
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212774
Ikuo Okada, Yasunao Saitoh, Takashi Ohkubo, Misao Sekimoto, Tadahito Matsuda
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212775
Equipment and Metrology
Ryoichi Hirano, Kazuto Matsuki, Shusuke Yoshitake, Yoshihiko Takahashi, Shuichi Tamamushi, Yoji Ogawa, Toru Tojo
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212776
Shusuke Yoshitake, Kazuto Matsuki, Satoshi Yamasaki, Ryoichi Hirano, Shuichi Tamamushi, Yoji Ogawa, Toru Tojo
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212777
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212778
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212780
Phase-Shift Mask and Optical Proximity Correction
Giang T. Dao, Gang Liu, Robert F. Hainsey, Jeff N. Farnsworth, Yasuo Tokoro, Susumu Kawada, Tsuneo Yamamoto, Nobuyuki Yoshioka, Akira Chiba, et al.
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212781
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212782
Hideaki Mitsui, Hiroyuki Sakai, Yoichi Yamaguchi
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212783
Kenji Kawano, Masafumi Asano, Satoshi Tanaka, Takayuki Iwamatsu, Hiroyuki Sato, Shinichi Ito
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212784
Yoshiro Yamada, Kazuaki Chiba, Eisei Karikawa, Hiromasa Unno, Yasutaka Kikuchi, Katsuhiro Kinemura, Masao Otaki
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212785
Yoshiki Kojima, Mitsunori Nakatani, Hirofumi Nakano, Kazuya Kamon, Kazuhiko Sato
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212786
Jun Ushioda, Yuko Seki, Hiroyoshi Tanabe, Yukio Ogura, Katsumi Maeda, Takeshi Ohfuji
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212787
Sung-Chul Lim, Sang-Gyun Woo, Woo-Sung Han, Young-Bum Koh, Moon-Yong Lee
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212788
Inspection, Repair, Design Automation, and Management
Manabu Tomita, Hidetoshi Ohnuma, Masaaki Koyama, Hiroichi Kawahira
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212789
Robert Veltman, Itsuji Ashida, Kunihiko Tsuboi
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212791
Kazuya Kamon, Wataru Wakamiya, Hitoshi Nagata, Koichi Moriizumi, Teruo Miyamoto, Yasuhito Myoi, Masaaki Tanaka
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212792
Toshiyuki Horiuchi, Katsuhiro Harada, Yoshinobu Takeuchi, Yoshiaki Mimura, Emi Tamechika
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212793
James A. Reynolds, Franklin M. Schellenberg
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212794
Yair Eran, Gad Greenberg, Gideon Rossman
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212795
Tsuneyuki Hagiwara
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212796
Satoshi Akutagawa, Satoshi Araihara, Itaru Sakai
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212797
Equipment and Metrology
Tadahiro Takigawa, Toru Tojo, Yoji Ogawa, Kiyomi Koyama, Akira Ono, Soichi Inoue, Shinichi Ito, Mineo Goto
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212798
Phase-Shift Mask and Optical Proximity Correction
Regine G. Tarascon
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212799
Akira Imai, Tsuneo Terasawa, Norio Hasegawa, Naoko Asai, Toshihiko P. Tanaka, Shinji Okazaki
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212800
Taro Saito, Hideyuki Jinbo, K. Yano, Seki Suzuki, Yoshio Tanaka
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212802
Yoshihiko Okamoto, Kazuhiro Gyouda
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212803
Keisuke Tsudaka, Manabu Tomita, Minoru Sugawara, Hiroichi Kawahira, Satoru Nozawa
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212804
Inspection, Repair, Design Automation, and Management
Diane K. Stewart, John A. Doherty, Andrew F. Doyle, John C. Morgan
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212805
Kazuo Aita, Yoshihiro Koyama, Hiroshi Matsumura, Takashi Kaito, Yasushi Satoh, Katsuhide Tsuchiya, Shigeru Noguchi
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212806
Hiroichi Kawahira, Yoshiki Suzuki
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212807
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212808
Osamu Tsubakida, T. Ban, T. Kojima, Akira Morishige, T. Yoshizawa
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212809
Thomas P. Coleman, Charles A. Sauer, Robert J. Naber, Henry Chris Hamaker
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212810
Ming-Huei Lin, Shen Chung Kuo
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212812
Equipment and Metrology
Proceedings Volume Photomask and X-Ray Mask Technology II, (1995) https://doi.org/10.1117/12.212813
Back to Top