PROCEEDINGS VOLUME 3096
PHOTOMASK JAPAN '97 | 17-18 APRIL 1997
Photomask and X-Ray Mask Technology IV
Editor(s): Naoaki Aizaki
Editor Affiliations +
PHOTOMASK JAPAN '97
17-18 April 1997
Kawasaki City, Japan
Photomask Process and Materials
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277248
Hideo Kobayashi, Takao Higuchi, Keishi Asakawa, Yasunori Yokoya, Kazuhide Yamashiro
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277277
Equipment, Cleaning, and Pelliclization
Kenji Ohtoshi, Satoshi Yamasaki, Shuichi Tamamushi, Toru Tojo, Ryoichi Hirano, Yuuji Fukudome, Naoharu Shimomura, Shinsuke Nishimura, Shusuke Yoshitake, et al.
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277287
Hidetoshi Satoh, Yasuhiro Someda, Norio Saitou, Katsuhiro Kawasaki, Kazui Mizuno, Yasuhiro Kadowaki, Morihisa Hoga, Takashi Soga
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277297
Hitoshi Handa, Masumi Takahashi, Yutaka Miyahara
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277298
Shigeto Shigematsu, Hitomi Matsuzaki, Norio Nakayama, H. Mase
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277299
Design Automation
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277300
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277249
Eiji Tsujimoto, Takahiro Watanabe, Yoshio Sato, Akemi Moniwa, Yoshinobu Igarashi, Kyoji Nakajo
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277250
Advanced Optical Lithography and Next-Generation Reticle Format
Masaru Sasago
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277251
Morihisa Hoga, Masahiro Nei, Ryuichi Ebinuma
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277252
Mikio Katsumata, Hiroichi Kawahira, Satoru Nozawa
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277253
Eiichi Hoshino, Hideaki Hasegawa, Kunio Shishido, Nobuyuki Yoshioka, Satoshi Aoyama, Atsushi Hayashi, Takaei Sasaki, Michael Hiroyuki Iso, Yasuo Tokoro
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277254
Masahiro Kondou, T. Tsumoto, Tadaaki Hayashi, Osamu Nagarekawa
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277255
Mask for X Ray and E-Beam
Nobutoshi Mizusawa, Yutaka Watanabe, Shinichi Hara, Kenji Saitoh, Hiroshi Maehara, Mitsuaki Amemiya, Shunichi Uzawa
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277256
Yoshihisa Iba, Fumiaki Kumasaka, Hajime Aoyama, Takao Taguchi, Masaki Yamabe
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277257
Masatoshi Oda, Miho Sakatani, Shingo Uchiyama, Tadahito Matsuda
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277258
Isao Amemiya, Kazuhiro Ohhashi, S. Yasumatsu, Shigekazu Matsui, Osamu Nagarekawa
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277259
Phase-Shift Mask and Repair
Yuko Seki, Jun Ushioda, Takashi Saito, Katsumi Maeda, Kaichiro Nakano, Shigeyuki Iwasa, Takeshi Ohfuji, Hiroshi Tanabe
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277260
Eunah Kim, Seungbum Hong, Zhong-Tao Jiang, Sung-Chul Lim, Sang-Gyun Woo, Young-Bum Koh, Kwangsoo No
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277261
Akihiro Otaka, Yoshio Kawai, Yutaka Sakakibara
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277262
Masami Matsumoto, Tsukasa Abe, Toshifumi Yokoyama, Hiroyuki Miyashita, Naoya Hayashi, Hisatake Sano
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277263
J. David Casey Jr., Andrew F. Doyle, Diane K. Stewart, David C. Ferranti
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277264
Inspection and Metrology
Yasutaka Morikawa, Takashi Ogawa, Katsuhide Tsuchiya, Shigeru Noguchi, Katsuyoshi Nakashima
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277265
Mitsuo Tabata, Kyoji Yamashita, Hideo Tsuchiya, Takehiko Nomura, Hiromu Inoue, Tomohide Watanabe, Toru Tojo, Hisakazu Yoshino
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277266
An Tran, Michael R. Schmidt, Jeff N. Farnsworth, Pei-yang Yan
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277268
Taro Ototake, Eiji Matsubara, Keiichi Hosoi
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277269
Photomask Process and Materials
Kotaro Shirabe, Eiichi Hoshino, Keiji Watanabe
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277270
Byung Guk Kim, Seong-Woon Choi, Yong Hun Yu, Hee-Sun Yoon, Jung-Min Sohn
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277271
Noriyuki Mitao, Nobunori Abe, Atsushi Kawata, Kiyoshi Tanaka, Yuhichi Yamamoto, Toshikatsu Minagawa, Masahiro Uraguchi, Michio Ogawa
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277272
Peter D. Buck, Robert A. Holmstrom
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277273
Mask for X Ray and E-Beam
Yuusuke Tanaka, Takuya Yoshihara, Shinji Tsuboi, Kiyoshi Fujii, Katsumi Suzuki
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277274
Ikuo Okada, Yasunao Saitoh, Makoto Hamashima, Misao Sekimoto, Tadahito Matsuda
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277275
Takahiro Ema, Hiroshi Yamashita, Ken Nakajima, Hiroshi Nozue
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277276
Phase-Shift Mask and Repair
Shinji Ishida, Tadao Yasuzato, Hiroyoshi Tanabe, Kunihiko Kasama
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277278
Shoichi Hirooka, Shigeru Hasebe, Tomohiro Tsutsui, Shigeki Nojima, Hisako Aoyama, Hidehiro Watanabe
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277279
Tadashi Matsuo, Kinji Ohkubo, Takashi Haraguchi, Kohsuke Ueyama
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277280
Akihiro Nakae, Shuji Nakao, Yasuji Matsui
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277281
John S. Petersen, Alvina M. Williams, Georgia K. Rich, Daniel A. Miller, Arturo M. Martinez Jr.
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277282
Mark L. Raphaelian, M. F. Ellis, David C. Ferranti, Diane K. Stewart
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277283
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277284
Inspection and Metrology
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277285
Hiromu Inoue, Kentaro Okuda, Takehiko Nomura, Hideo Tsuchiya, Mitsuo Tabata
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277286
NamKyu Park, Hwa-Sup Bae, Jong-woon Chang, Seung-Woo Yoo
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277288
Yair Eran, Gad Greenberg, Amnon Joseph, Cornel Lustig, Eyal Mizrahi
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277289
Daikichi Awamura, Katsuyoshi Nakashima, Yasunori Hada, Takayoshi Matsuyama, Kenichi Kobayashi
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277290
Design Automation
Takashi Kamikubo, Takayuki Abe, Susumu Oogi, Hirohito Anze, Mitsuko Shimizu, Masamitsu Itoh, Tetsuro Nakasugi, Tomohiro Iijima, Yoshiaki Hattori
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277291
Kyoji Nakajo, Junya Sakemi, Akemi Moniwa, Tsuneo Terasawa, Norio Hasegawa, Eiji Tsujimoto
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277292
Ryuji Takenouchi, Hidetoshi Ohnuma, Isao Ashida, Satoru Nozawa
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277293
Equipment, Cleaning, and Pelliclization
Hiroshi Tsuji, Hiroya Ohta, Hidetoshi Satoh, Koji Nagata, Norio Saitou
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277294
Frank E. Abboud, Robert L. Dean, Janine J. Doering, W. Eckes, Mark A. Gesley, Ulrich Hofmann, Terry Mulera, Robert J. Naber, M. Pastor, et al.
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277295
Tadashi Komagata, Yasutoshi Nakagawa, Hitoshi Takemura, Nobuo Gotoh
Proceedings Volume Photomask and X-Ray Mask Technology IV, (1997) https://doi.org/10.1117/12.277296
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