18TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT
16-18 September 1998
Redwood City, CA, United States
Photomask Patterning
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332813
Yasutoshi Nakagawa, Tadashi Komagata, Hitoshi Takemura, Nobuo Gotoh, Kazumitsu Tanaka
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332823
Byung-Cheol Cha, Jin-Min Kim, Byung Guk Kim, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332834
Wolfram Ziegler, Anja Rosenbusch
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332844
Jan M. Chabala, Frank E. Abboud, Suzanne Weaver, Damon M. Cole
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332854
Overview Presentation
Emilio P. Gonzalez-Lao
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332863
Resist, Materials, and Processes
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332879
Maiying Lu, Thomas P. Coleman, Charles A. Sauer
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332814
Defects, Inspection, and Repair
Yosi Shani, Ian Melnik, Sasha Yoffe, Yuval Sharon, Klony S. Lieberman, Hanan Terkel
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332815
Jerry Xiaoming Chen, Robert K. Henderson, Franklin D. Kalk
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332816
Duane Dutton, Wayne P. Shen, Richard Yee, James A. Reynolds
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332817
Eli Almog, Roger F. Caldwell, Fang Cheng Chang, J. Fung Chen, Nigel R. Farrar, Linard Karklin, Thomas L. Laidig, Saeed Sabouri, Wayne P. Shen, et al.
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332818
Mask Metrology
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332819
Waiman Ng, Geoffrey T. Anderson, Suzanne Weaver, Homer Y. Lem
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332820
Robert Uitz, John M. Whittey
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332821
Wen Chen, James A. Carroll, Glenn Storm, Ronald G. Ivancich, John P. Maloney, Olivier Maurin, Eric Souleillet
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332822
Michael R. Schmidt, Leonard F. Dubuque, Lyndon Scott Gibbs
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332824
Advanced Mask Technology
Stephen P. Vernon, Patrick A. Kearney, William M. Tong, Shon T. Prisbrey, Cindy C. Larson, Craig E. Moore, Frank J. Weber, Gregory Frank Cardinale, Pei-yang Yan, et al.
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332826
Albrecht Ehrmann, Sabine Huber, Rainer Kaesmaier, Andreas B. Oelmann, Thomas Struck, Reinhard Springer, Joerg Butschke, Florian Letzkus, Karl Kragler, et al.
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332827
Pei-yang Yan, Souping Yan, Guojing Zhang, Patrick A. Kearney, John D. Richards, Patrick Kofron, Jenn Chow
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332828
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332829
Resolution Enhancement Techniques
Andrew B. Kahng, Huijuan Wang, Alexander Zelikovsky
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332830
Wilhelm Maurer, Christoph M. Friedrich
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332831
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332832
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332833
Akihiko Ando, Yoji Tono-oka, Hiroyuki Shigemura, Haruo Iwasaki, Hiroyoshi Tanabe
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332835
BACUS '98 Special Focus Program on Mask Technology and the 1998 National Technology Roadmap for Semiconductors
Klaus-Dieter Rinnen
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332836
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332837
Haruo Iwasaki, Hiroyoshi Tanabe, Takashi Inoue, Yoshiyuki Tanaka
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332838
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332839
John L. Nistler, Mark Michael, Fred N. Hause, Richard D. Edwards
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332840
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332841
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332842
Wallace R. Carpenter, Kimberly Sadler, Thomas White
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332843
Poster Session: Resist, Materials, and Processes
Wu-Song Huang, Ranee W. Kwong, Wayne M. Moreau, Marie Angelopoulos, Jim Bucchiagnano, Karen E. Petrillo, Hiroshi Ito
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332845
Poster Session: Resolution Enhancement Techniques (OPC/PSM)
Warren W. Flack, Sylvia White, Calvin Ho, Dan L. Schurz, Fabio Consentino
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332846
Graham G. Arthur, Brian Martin, Christine Wallace, Anja Rosenbusch, Huw Fryer
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332847
Poster Session: Defects, Inspection, and Repair
Rudolf Poschenrieder, Bernd Hay, Matthias Beier, Andrew C. Hourd, Harald Stuemer, Thomas M. Gairing
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332848
Poster Session: Resist, Materials, and Processes
Thomas L. Brown, Kunihiro Ito
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332849
Poster Session: Defects, Inspection, and Repair
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332850
Poster Session: Mask Metrology
Syed A. Rizvi, Nathan A. Diachun
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332851
Poster Session: Resist, Materials, and Processes
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332852
Poster Session: Mask Metrology
Michael T. Takac, John M. Whittey
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332853
Poster Session: Photomask Patterning
Wayne P. Shen
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332855
Poster Session: Resolution Enhancement Techniques (OPC/PSM)
Anja Rosenbusch, Andrew C. Hourd, Casper A. H. Juffermans, Hartmut Kirsch, Frederic P. Lalanne, Wilhelm Maurer, Carmelo Romeo, Kurt G. Ronse, Patrick Schiavone, et al.
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332856
Poster Session: Advanced Mask Technology
Gillian A. M. Reynolds, Roger H. French, Peter F. Carcia, Charlie C. Torardi, Greg P. Hughes, David J. Jones, M. F. Lemon, M. H. Reilly, L. Wilson, et al.
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332857
Poster Session: Resolution Enhancement Techniques (OPC/PSM)
Yulia O. Korobko, Mei-Chien Lu, Jesmar Telans, Jeffrey E. Powers
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332858
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332859
Poster Session: Resist, Materials, and Processes
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332860
Poster Session: Resolution Enhancement Techniques (OPC/PSM)
Robert John Socha, John S. Petersen, J. Fung Chen, Thomas L. Laidig, Kurt E. Wampler, Roger F. Caldwell
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332861
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332862
Poster Session: Resist, Materials, and Processes
Frederick T. Chen, Wilman Tsai, Scott Chegwidden, S. Yu, Marilyn Kamna, Jeff N. Farnsworth, Thomas P. Coleman
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332864
Poster Session: Advanced Mask Technology
Seongtae Jeong, Mourad Idir, Lewis E. Johnson, Yun Lin, Phillip J. Batson, Richard Levesque, Patrick A. Kearney, Pei-yang Yan, Eric M. Gullikson, et al.
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332865
Takahiro Matsuo, Keisuke Nakazawa, Tohru Ogawa
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332866
Poster Session: Resolution Enhancement Techniques (OPC/PSM)
Scott M. Mansfield, Richard A. Ferguson, Lars W. Liebmann, Antoinette F. Molless, Alfred K. K. Wong
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332867
Poster Session: Mask Metrology
Takayuki Iwamatsu, Koji Hiruta, Hiroaki Morimoto, Masashi Ataka, Jun Nitta
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332868
Poster Session: Defects, Inspection, and Repair
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332869
Poster Session: Photomask Patterning
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332870
Hao Hsing Lu, Raymond Hwang, Vincent Lee, Willy Q, J. Fung Chen, Thomas L. Laidig, Kurt E. Wampler, Roger F. Caldwell
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332871
Poster Session: Defects, Inspection, and Repair
Richard A. Haight, Dennis Hayden, Peter Longo, Timothy E. Neary, Alfred Wagner
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332872
Poster Session: Advanced Mask Technology
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332873
Poster Session: Photomask Patterning
Min Bai, Daniel S. Pickard, Corina Tanasa, Mark A. McCord, C. Neil Berglund, Roger Fabian W. Pease
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332874
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332875
Poster Session: Resolution Enhancement Techniques (OPC/PSM)
Yasutaka Kikuchi, Takashi Seno, Kensuke Kawanabe, Eiji Bunki, Yuki Otsuka, Yoshiro Yamada
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332876
Poster Session: Advanced Mask Technology
Steven J. Spector, Donald L. White, Donald M. Tennant, Ping Luo, Obert R. Wood II
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332877
Poster Session: Defects, Inspection, and Repair
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332878
Keynote Address
Proceedings Volume 18th Annual BACUS Symposium on Photomask Technology and Management, (1998) https://doi.org/10.1117/12.332825
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