Front Matter: Volume 7028
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702801 (2008) https://doi.org/10.1117/12.801299
Material for Photomask
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702802 (2008) https://doi.org/10.1117/12.796009
Toshio Konishi, Yosuke Kojima, Hiroyuki Takahashi, Masato Tanabe, Takashi Haraguchi, Matthew Lamantia, Yuichi Fukushima, Yoshimitsu Okuda
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702803 (2008) https://doi.org/10.1117/12.796010
Masahiro Hashimoto, Hiroyuki Iwashita, Atsushi Kominato, Hiroaki Shishido, Masao Ushida, Hideaki Mitsui
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702804 (2008) https://doi.org/10.1117/12.793013
Ryugo Hikichi, Hiroyuki Ishii, Hidekazu Migita, Noriko Kakehi, Mochihiro Shimizu, Hideyoshi Takamizawa, Tsugumi Nagano, Masahiro Hashimoto, Hiroyuki Iwashita, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702805 (2008) https://doi.org/10.1117/12.793014
Photomask Process Technology
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702807 (2008) https://doi.org/10.1117/12.793016
Roman Gouk, Jason Jeon, Fred Li, James Papanu, Banqiu Wu, Rao Yalamanchili
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702808 (2008) https://doi.org/10.1117/12.793017
Kenji Masui, Tetsuo Takemoto, Kyo Otsubo, Mari Sakai, Tomotaka Higaki, Hidehiro Watanabe, Tsutomu Kikuchi, Yoshiaki Kurokawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702809 (2008) https://doi.org/10.1117/12.793018
Writing Technology
Gerard M. Schmid, Niyaz Khusnatdinov, Cynthia B. Brooks, Dwayne LaBrake, Ecron Thompson, Douglas J. Resnick
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280A (2008) https://doi.org/10.1117/12.796015
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280B (2008) https://doi.org/10.1117/12.793019
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280C (2008) https://doi.org/10.1117/12.793020
Masato Saito, Masamitsu Itoh, Osamu Ikenaga, Kazutaka Ishigo
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280D (2008) https://doi.org/10.1117/12.793021
Won-Tai Ki, Ji-Hyeon Choi, Byung-Gook Kim, Sang-Gyun Woo, Han-Ku Cho
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280E (2008) https://doi.org/10.1117/12.793022
MDP
Brian Dillon, Tim Norris
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280F (2008) https://doi.org/10.1117/12.793023
G. Chen, J.-S. Wang, S. Bai, R. Howell, J. Wiley, A. Vacca, T. Kurosawa, T. Nishibe, T. Takigawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280G (2008) https://doi.org/10.1117/12.793024
NGL I
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280I (2008) https://doi.org/10.1117/12.793025
Yasushi Nishiyama, Tsuyoshi Amano, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Tomokazu Kozakai, Syuichi Kikuchi, Kensuke Shiina, Anto Yasaka, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280J (2008) https://doi.org/10.1117/12.793026
EDA and DFM for Photomask I
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280L (2008) https://doi.org/10.1117/12.793028
Andrew B. Kahng, Swamy V. Muddu
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280M (2008) https://doi.org/10.1117/12.793029
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280N (2008) https://doi.org/10.1117/12.793030
Sachiko Kobayashi, Suigen Kyoh, Koichi Kinoshita, Yukihiro Urakawa, Eiji Morifuji, Satoshi Kuramoto, Soichi Inoue
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280O (2008) https://doi.org/10.1117/12.793031
NGL II
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280P (2008) https://doi.org/10.1117/12.793032
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280R (2008) https://doi.org/10.1117/12.793034
EDA and DFM for Photomask II
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280S (2008) https://doi.org/10.1117/12.793035
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280T (2008) https://doi.org/10.1117/12.793036
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280U (2008) https://doi.org/10.1117/12.793037
OPC and Lithography Technologies I
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280V (2008) https://doi.org/10.1117/12.796014
Kenji Yoshida, Soichi Inoue, Koji Hashimoto, Satoshi Tanaka, Masaki Satake, Takashi Obara, Kazuhiro Takahata, Eiji Yamanaka, Mitsuyo Kariya, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280W (2008) https://doi.org/10.1117/12.793038
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280X (2008) https://doi.org/10.1117/12.793039
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280Y (2008) https://doi.org/10.1117/12.793040
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70280Z (2008) https://doi.org/10.1117/12.793041
OPC and Lithography Technologies II
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702810 (2008) https://doi.org/10.1117/12.796016
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702811 (2008) https://doi.org/10.1117/12.798440
Hidefumi Mukai, Yuuji Kobayashi, Shinji Yamaguchi, Kenji Kawano, Kohji Hashimoto
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702812 (2008) https://doi.org/10.1117/12.800464
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702813 (2008) https://doi.org/10.1117/12.793044
Shoji Mimotogi, Tomotaka Higaki, Hideki Kanai, Satoshi Tanaka, Masaki Satake, Yosuke Kitamura, Katsuyoshi Kodera, Kazutaka Ishigo, Takuya Kono, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702814 (2008) https://doi.org/10.1117/12.793045
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702815 (2008) https://doi.org/10.1117/12.793046
Progressive Defect (Haze)
Anna Tchikoulaeva, Andre Holfeld, Markus Arend, Eugen Foca
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702816 (2008) https://doi.org/10.1117/12.793047
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702817 (2008) https://doi.org/10.1117/12.793048
Jaehyuck Choi, Jin-sik Jung, Han-shin Lee, Jongkeun Oh, Soojung Kang, Haeyong Jeong, Yonghoon Kim, HanKu Cho
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702818 (2008) https://doi.org/10.1117/12.793049
Repairing Technology
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281A (2008) https://doi.org/10.1117/12.793052
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281C (2008) https://doi.org/10.1117/12.793054
Inspection Technology
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281E (2008) https://doi.org/10.1117/12.793055
Carl Hess, Mark Wihl, Rui-fang Shi, Yalin Xiong, Song Pang
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281F (2008) https://doi.org/10.1117/12.793056
Hyun Joo Baik, Dong Hoon Chung, Yong Hoon Kim, Han Ku Cho, Amir Sagiv, Shmoolik Mangan, Ziv Parizat, Eun Young Park, Yaniv Brami, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281G (2008) https://doi.org/10.1117/12.793057
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281H (2008) https://doi.org/10.1117/12.793058
Hideyuki Moribe, Yoshikazu Kato, Kazuyoshi Nakamura, Takeshi Bashomatsu, Takahiro Igeta, Kazuhito Ogihara, Takehiko Okada
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281I (2008) https://doi.org/10.1117/12.793059
Andy Lan, Jenny Hsu, Swapnajit Chakravarty, Vincent Hsu, Ellison Chen, Eric Lu, John Miller
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281J (2008) https://doi.org/10.1117/12.793060
Metrology for Photomask
Heebom Kim, MyoungSoo Lee, Sukho Lee, Young-Su Sung, Byunggook Kim, Sang-Gyun Woo, HanKu Cho, Michael Ben Yishai, Lior Shoval, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281K (2008) https://doi.org/10.1117/12.793061
Dan Rost, Michael Ben-Yishai, Lior Shoval, Christophe Couderc
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281L (2008) https://doi.org/10.1117/12.793062
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281M (2008) https://doi.org/10.1117/12.793063
Tastuya Aihara, Shinpei Kondo, Masaru Higuchi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281N (2008) https://doi.org/10.1117/12.793064
Yongkyoo Choi, Sunghyun Oh, Munsik Kim, Yongdae Kim, Changreol Kim
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281O (2008) https://doi.org/10.1117/12.793065
Cost and Strategy on Photomask
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281P (2008) https://doi.org/10.1117/12.793067
Poster Session 5a: NGL
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281Q (2008) https://doi.org/10.1117/12.793068
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281R (2008) https://doi.org/10.1117/12.793069
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281S (2008) https://doi.org/10.1117/12.793070
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281T (2008) https://doi.org/10.1117/12.793071
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281U (2008) https://doi.org/10.1117/12.799668
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281V (2008) https://doi.org/10.1117/12.793072
Akiko Fujii, Yuko Sakai, Jun Mizuochi, Takaaki Hiraka, Satoshi Yusa, Koki Kuriyama, Masashi Sakaki, Takanori Sutou, Shiho Sasaki, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281W (2008) https://doi.org/10.1117/12.793073
Poster Session 5b: Writing Technology
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281X (2008) https://doi.org/10.1117/12.793074
Noriyuki Kobayashi, Kazuya Goto, Tetsuro Wakatsuki, Tadashi Komagata, Yasutoshi Nakagawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281Y (2008) https://doi.org/10.1117/12.793076
Kezhao Xing, Charles Björnberg, Henrik Karlsson, Adisa Paulsson, Peter Beiming, Jukka Vedenpää, Jonathan Walford
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70281Z (2008) https://doi.org/10.1117/12.793077
Poster Session 5c: Process Technology
Zhigang Mao, Xiaoyi Chen, David Knick, Michael Grimbergen, Madhavi Chandrahood, Ibrahim Ibrahim, Ajay Kumar
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702823 (2008) https://doi.org/10.1117/12.793080
Guen-Ho Hwang, Manish Patil, Soon-Kyu Seo, Chu-Bong Yu, Ik-Boum Hur, Dong Hyun Kim, Cheol Shin, Sung-Mo Jung, Yong-Hyun Lee, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702824 (2008) https://doi.org/10.1117/12.793081
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702825 (2008) https://doi.org/10.1117/12.793082
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702826 (2008) https://doi.org/10.1117/12.798454
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702828 (2008) https://doi.org/10.1117/12.798462
Poster Session 5d: Progressive Defect (Haze)
Haruko Akutsu, Shinji Yamaguchi, Kyo Otsubo, Makiko Tamaoki, Ayako Shimazaki, Reiko Yoshimura, Fumihiko Aiga, Tsukasa Tada
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702829 (2008) https://doi.org/10.1117/12.793083
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282B (2008) https://doi.org/10.1117/12.793085
Manish Patil, Jong-Min Kim, Sung-Mo Jung, Ik-Boum Hur, Sang-Soo Choi, Yong Hyun Lee
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282C (2008) https://doi.org/10.1117/12.793086
Cathy Liu, Alex Lu, Crystal Wang, Eric Guo, Dongsheng Fan, Lisa Yun, Steven Liu, Raj Badoni, Eric Lu
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282D (2008) https://doi.org/10.1117/12.793087
Fu-Sheng Chu, Shean-Hwan Chiou
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282E (2008) https://doi.org/10.1117/12.799404
Dae-Jin Kim, Hyun-Jung Kim, Seung-Hwan Eom, Kwang-Jae Lee, Woon-Ki Cho, Sang-Hyun Chung
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282F (2008) https://doi.org/10.1117/12.799405
David L. Halbmaier, Yasushi Ohyashiki, Oleg Kishkovich
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282G (2008) https://doi.org/10.1117/12.799669
Dong-Seok Lee, Hyun-Ju Jung, Jung-Kwan Lee, Woo-Gun Jung, Dong-Heok Lee, Cheol Shin, Sang-Soo Choi, Moon-Hwan Choi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282H (2008) https://doi.org/10.1117/12.793051
Poster Session 5e: Inspection
Hideo Tsuchiya, Masakazu Tokita, Takehiko Nomura, Tadao Inoue
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282I (2008) https://doi.org/10.1117/12.793088
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282J (2008) https://doi.org/10.1117/12.793089
Hideyuki Moribe, Takeshi Bashomatsu, Kenichi Matsumura, Akira Uehara, Hiroyuki Takahashi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282K (2008) https://doi.org/10.1117/12.793090
Arosha Goonesekera, Heiko Schmalfuss, Isaac Lee, Chun Guan, Aditya Dayal, Thomas Schulmeyer, Jan Heumann
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282L (2008) https://doi.org/10.1117/12.793091
Koji Kaneko, Takanobu Kobayashi, Jinggang Zhu, Norihiko Takatsu, Paul Yu, Kosuke Ito, Toshiaki Kojima, Yoshinori Nagaoka
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282M (2008) https://doi.org/10.1117/12.793092
Russell Dover, Jinggang Zhu, Norbert Schmidt, Michael Lang
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282N (2008) https://doi.org/10.1117/12.793093
S. M. Yen, Swapnajit Chakravarty, Joe Huang, John Miller, Russell Dover, Den Wang
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282O (2008) https://doi.org/10.1117/12.793094
Chain-Ting Huang, Yung-Feng Cheng, Shih-Ming Kuo, Chun-Hsien Huang, Swapnajit Chakravarty, Joe Huang, Jeff Lin, Den Wang
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282P (2008) https://doi.org/10.1117/12.793095
Dan Rost, Raunak Mann, Ryan Gardner, Dana Bernstein, Dax Olvera, Simon Kurin, Christophe Couderc
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282Q (2008) https://doi.org/10.1117/12.793096
Shinji Kunitani, Atsushi Kobayashi, Susumu Nagashige
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282R (2008) https://doi.org/10.1117/12.793097
Poster Session 5f: Metrology for Photomask
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282S (2008) https://doi.org/10.1117/12.793098
Masaaki Kurihara, Sho Hatakeyama, Kouji Yoshida, Makoto Abe, Daisuke Totsukawa, Yasutaka Morikawa, Hiroshi Mohri, Naoya Hayashi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282T (2008) https://doi.org/10.1117/12.793099
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282U (2008) https://doi.org/10.1117/12.793100
Hyemi Lee, Goomin Jeong, Kangjun Seo, Sangchul Kim, changreol kim
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282V (2008) https://doi.org/10.1117/12.793101
Thomas Scherübl, Ulrich Strößner, Holger Seitz, Robert Birkner, Rigo Richter
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282W (2008) https://doi.org/10.1117/12.793102
Amir Sagiv, Netanel Polonsky, Oren Boiman, Lior Shoval, Michael Ben-Yishai, Shmoolik Mangan
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282X (2008) https://doi.org/10.1117/12.793103
Christian Enkrich, Gunter Antesberger, Oliver Loeffler, Klaus-Dieter Roeth, Frank Laske, Karl-Heinrich Schmidt, Dieter Adam
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282Y (2008) https://doi.org/10.1117/12.793104
Ute Buttgereit, Robert Birkner, Dirk Seidel, Sascha Perlitz, Vicky Philipsen, Peter De Bisschop
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 70282Z (2008) https://doi.org/10.1117/12.793105
Marc Hauptmann, Lukas M. Eng, Jan Richter
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702830 (2008) https://doi.org/10.1117/12.793106
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702831 (2008) https://doi.org/10.1117/12.793107
G. Klose, D. Beyer, M. Arnz, N. Kerwien, N. Rosenkranz
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702832 (2008) https://doi.org/10.1117/12.799407
Poster Session 5g: MDP
John Nogatch, Dan Hung, Raghava Kondepudy, Johnny Yeap
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702833 (2008) https://doi.org/10.1117/12.793108
Kokoro Kato, Yoshiyuki Taniguchi, Masakazu Endo, Kuninori Nishizawa, Tadao Inoue, Toshiaki Fujii
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702834 (2008) https://doi.org/10.1117/12.793111
Poster Session 5h: EDA and DFM
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702835 (2008) https://doi.org/10.1117/12.793112
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702836 (2008) https://doi.org/10.1117/12.793113
Yoshikazu Nagamura, Shogo Narukawa, Yoshiharu Shika, Hiroshi Kabashima, Aki Nakajo, Isao Miyazaki, Satoshi Aoyama, Yasutaka Morikawa, Hiroshi Mohri, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XV, 702837 (2008) https://doi.org/10.1117/12.793114