Proceedings Volume 7488 is from: Logo
SPIE PHOTOMASK TECHNOLOGY
14-17 September 2009
Monterey, California, United States
Front Matter: Volume 7488
Proceedings Volume Photomask Technology 2009, 748801 (2009) https://doi.org/10.1117/12.848146
Invited Session
Proceedings Volume Photomask Technology 2009, 748803 (2009) https://doi.org/10.1117/12.832722
Proceedings Volume Photomask Technology 2009, 748805 (2009) https://doi.org/10.1117/12.835786
Defect Inspection and Disposition
Proceedings Volume Photomask Technology 2009, 748807 (2009) https://doi.org/10.1117/12.830668
Proceedings Volume Photomask Technology 2009, 748808 (2009) https://doi.org/10.1117/12.829637
Proceedings Volume Photomask Technology 2009, 748809 (2009) https://doi.org/10.1117/12.830034
George Chen, James N. Wiley, Jen-Shiang Wang, Rafael C. Howell, Shufeng Bai, Yi-Fan Chen, Frank Chen, Yu Cao, Tadahiro Takigawa, et al.
Proceedings Volume Photomask Technology 2009, 74880A (2009) https://doi.org/10.1117/12.831475
Proceedings Volume Photomask Technology 2009, 74880B (2009) https://doi.org/10.1117/12.829739
Defect Inspection and Repair
Shuichi Tamamushi, Noriyuki Takamatsu
Proceedings Volume Photomask Technology 2009, 74880C (2009) https://doi.org/10.1117/12.833513
Anna Tchikoulaeva, Remo Kirsch, Stephanie Winkelmeier
Proceedings Volume Photomask Technology 2009, 74880D (2009) https://doi.org/10.1117/12.834830
Tod Robinson, Roy White, Ron Bozak, Ken Roessler, Bernie Arruza, Dennis Hogle, Mike Archuletta, David Lee
Proceedings Volume Photomask Technology 2009, 74880F (2009) https://doi.org/10.1117/12.847238
Eric Guo, Shirley Zhao, Skin Zhang, Sandy Qian, Guojie Cheng, Abhishek Vikram, Ling Li, Ye Chen, Chingyun Hsiang, et al.
Proceedings Volume Photomask Technology 2009, 74880G (2009) https://doi.org/10.1117/12.829692
Proceedings Volume Photomask Technology 2009, 74880H (2009) https://doi.org/10.1117/12.833404
Sz-Huei Wang, Yu-Wan Chen, Chung Ming Kuo, Erez Graitzer, Guy Ben-Zvi, Avi Cohen
Proceedings Volume Photomask Technology 2009, 74880I (2009) https://doi.org/10.1117/12.833442
Mask Films, Process Control, and Equipment
A. E. Zweber, T. Komizo, J. Levin, J. Whang, S. Nemoto, S. Kondo
Proceedings Volume Photomask Technology 2009, 74880J (2009) https://doi.org/10.1117/12.830123
Gaston Lee, Peter Dress, Ssuwei Chen, Uwe Dietze
Proceedings Volume Photomask Technology 2009, 74880K (2009) https://doi.org/10.1117/12.829613
Michael Grimbergen, D. G. Nest, Keven Yu, T. Y. Becky Leung, Madhavi Chandrachood, Alan Ouye, Saravjeet Singh, Ibrahim Ibrahim, Ajay Kumar, et al.
Proceedings Volume Photomask Technology 2009, 74880L (2009) https://doi.org/10.1117/12.833490
Sin-Ju Yang, Han-Sun Cha, Jin-ho Ahn, Kee-Soo Nam
Proceedings Volume Photomask Technology 2009, 74880M (2009) https://doi.org/10.1117/12.829749
Proceedings Volume Photomask Technology 2009, 74880N (2009) https://doi.org/10.1117/12.834302
Proceedings Volume Photomask Technology 2009, 74880O (2009) https://doi.org/10.1117/12.829743
Nano-Imprint and Patterned Media Technology II
Proceedings Volume Photomask Technology 2009, 74880T (2009) https://doi.org/10.1117/12.834581
Proceedings Volume Photomask Technology 2009, 74880U (2009) https://doi.org/10.1117/12.833468
Marcus Pritschow, Harald Dobberstein, Klaus Edinger, Mathias Irmscher, Douglas J. Resnick, Kosta Selinidis, Ecron Thompson, Markus Waiblinger
Proceedings Volume Photomask Technology 2009, 74880V (2009) https://doi.org/10.1117/12.833030
Noriko Yamashita, Tadashi Oomatsu, Satoshi Wakamatsu, Katsuhiro Nishimaki, Toshihiro Usa, Kazuyuki Usuki
Proceedings Volume Photomask Technology 2009, 74880W (2009) https://doi.org/10.1117/12.833466
Source-Mask Optimization
Vikram Tolani, Peter Hu, Danping Peng, Tom Cecil, Robert Sinn, Linyong Pang, Bob Gleason
Proceedings Volume Photomask Technology 2009, 74880Y (2009) https://doi.org/10.1117/12.833430
Amir Sagiv, Jo Finders, Robert Kazinczi, Andre Engelen, Frank Duray, Ingrid Minnaert-Janssen, Shmoolik Mangan, Dror Kasimov, Ilan Englard
Proceedings Volume Photomask Technology 2009, 74880Z (2009) https://doi.org/10.1117/12.832724
RET and OPC/ORC
Jinyu Zhang, Wei Xiong, Yan Wang, Zhiping Yu, Min-Chun Tsai
Proceedings Volume Photomask Technology 2009, 748811 (2009) https://doi.org/10.1117/12.834099
Byung-Gook Kim, Sung Soo Suh, Sang Gyun Woo, HanKu Cho, Guangming Xiao, Dong Hwan Son, Dave Irby, David Kim, Ki-Ho Baik
Proceedings Volume Photomask Technology 2009, 748812 (2009) https://doi.org/10.1117/12.833572
V. Farys, F. Chaoui, J. Entradas, F. Robert, O. Toublan, Y. Trouiller
Proceedings Volume Photomask Technology 2009, 748813 (2009) https://doi.org/10.1117/12.829894
Proceedings Volume Photomask Technology 2009, 748814 (2009) https://doi.org/10.1117/12.829717
Bayram Yenikaya, Oleg Alexandrov, Yongjun Kwon, Anwei Liu, Ali Mokhberi, Apo Sezginer
Proceedings Volume Photomask Technology 2009, 748815 (2009) https://doi.org/10.1117/12.829938
EUV Mask Substrates and Processing
Proceedings Volume Photomask Technology 2009, 748816 (2009) https://doi.org/10.1117/12.834746
Proceedings Volume Photomask Technology 2009, 748818 (2009) https://doi.org/10.1117/12.829873
Proceedings Volume Photomask Technology 2009, 748819 (2009) https://doi.org/10.1117/12.831127
Proceedings Volume Photomask Technology 2009, 74881B (2009) https://doi.org/10.1117/12.829724
Patterning Technology and Tools
L. Martin, S. Manakli, B. Icard, J. Pradelles, R. Orobtchouk, A. Poncet, L. Pain
Proceedings Volume Photomask Technology 2009, 74881C (2009) https://doi.org/10.1117/12.829893
Elmar Platzgummer, Christof Klein, Peter Joechl, Hans Loeschner, Martin Witt, Wolfgang Pilz, Joerg Butschke, Michael Jurisch, Florian Letzkus, et al.
Proceedings Volume Photomask Technology 2009, 74881D (2009) https://doi.org/10.1117/12.832156
Takashi Kamikubo, Kenji Ohtoshi, Noriaki Nakayamada, Rieko Nishimura, Hitoshi Sunaoshi, Kiminobu Akeno, Soichiro Mitsui, Yuichi Tachikawa, Hideo Inoue, et al.
Proceedings Volume Photomask Technology 2009, 74881E (2009) https://doi.org/10.1117/12.833462
Proceedings Volume Photomask Technology 2009, 74881F (2009) https://doi.org/10.1117/12.829732
Metrology I
B. Bodermann, D. Bergmann, E. Buhr, W. Hässler-Grohne, H. Bosse, J. Potzick, R. Dixson, R. Quintanilha, M. Stocker, et al.
Proceedings Volume Photomask Technology 2009, 74881H (2009) https://doi.org/10.1117/12.831373
J. Whittey, F. Laske, K.-D. Roeth, J. McCormack, D. Adam, J. Bender, C. N. Berglund, M. Takac, Seurien Chou
Proceedings Volume Photomask Technology 2009, 74881I (2009) https://doi.org/10.1117/12.833495
Z. Li, F. Pilarski, D. Bergmann, B. Bodermann
Proceedings Volume Photomask Technology 2009, 74881J (2009) https://doi.org/10.1117/12.829629
Albrecht Ullrich, Jan Richter
Proceedings Volume Photomask Technology 2009, 74881K (2009) https://doi.org/10.1117/12.830671
Metrology II
R. Quintanilha, B. M. Barnes, Y. Sohn, L. P. Howard, R. M. Silver, J. E. Potzick, M. T. Stocker
Proceedings Volume Photomask Technology 2009, 74881L (2009) https://doi.org/10.1117/12.829693
Klaus-Dieter Roeth, Frank Laske, Michael Heiden, Dieter Adam, Lidia Parisoli, Slawomir Czerkas, John Whittey, Karl-Heinrich Schmidt
Proceedings Volume Photomask Technology 2009, 74881M (2009) https://doi.org/10.1117/12.833203
Proceedings Volume Photomask Technology 2009, 74881N (2009) https://doi.org/10.1117/12.834869
Mark Wylie, Trent Hutchinson, Gang Pan, Thomas Vavul, John Miller, Aditya Dayal, Carl Hess, Mike Green, Shad Hedges, et al.
Proceedings Volume Photomask Technology 2009, 74881O (2009) https://doi.org/10.1117/12.830148
Ziv Parizat, Jo Finders, Marcel Demarteau, Onno Wissmans, Ingrid Minaert Janssen, Frank Duray, Michael Ben Yishai, Shmoolik Mangan, Yaron Cohen, et al.
Proceedings Volume Photomask Technology 2009, 74881P (2009) https://doi.org/10.1117/12.833467
Mask Cleaning and Maintenance
Charles Bowers, Ivin Varghese, Mehdi Balooch, Jaime Rodriguez
Proceedings Volume Photomask Technology 2009, 74881R (2009) https://doi.org/10.1117/12.829690
Nano-Imprint and Patterned Media Technology III
Kazuhiko Omote, Yoshiyasu Ito, Yuko Okazaki, Yuichi Kokaku
Proceedings Volume Photomask Technology 2009, 74881T (2009) https://doi.org/10.1117/12.833504
Hong Xiao, Long Ma, Fei Wang, Yan Zhao, Jack Jau, Kosta Selinidis, Ecron Thompson, S. V. Sreenivasan, Douglas J. Resnick
Proceedings Volume Photomask Technology 2009, 74881V (2009) https://doi.org/10.1117/12.833419
Justin J. Hwu, Sergey Babin, Lorena Page, Alex Danilevsky, Andy Self, Kazuhiro Ueda, Shunzuke Koshihara, Koichi Wago, Kim Lee, et al.
Proceedings Volume Photomask Technology 2009, 74881W (2009) https://doi.org/10.1117/12.830699
Nano-Imprint and Patterned Media Technology IV
Proceedings Volume Photomask Technology 2009, 74881X (2009) https://doi.org/10.1117/12.833285
Jeffrey Roberts, Linlin Hu, Torbjörn Eriksson, Kristian Thulin, Babak Heidari
Proceedings Volume Photomask Technology 2009, 74881Z (2009) https://doi.org/10.1117/12.833465
Gerard M. Schmid, Cynthia Brooks, Zhengmao Ye, Steve Johnson, Dwayne LaBrake, S. V. Sreenivasan, Douglas J. Resnick
Proceedings Volume Photomask Technology 2009, 748820 (2009) https://doi.org/10.1117/12.833366
Mask Business
Proceedings Volume Photomask Technology 2009, 748821 (2009) https://doi.org/10.1117/12.833505
Proceedings Volume Photomask Technology 2009, 748822 (2009) https://doi.org/10.1117/12.828953
Mask Data Preparation
Suheil Zaatri, Yan Liu, Michael Asturias, Joan McCall, Wei-Guo J. Lei, Tsafi Lapidot, Khen Ofek, Aviram Tam, Mark Wagner, et al.
Proceedings Volume Photomask Technology 2009, 748823 (2009) https://doi.org/10.1117/12.833443
Proceedings Volume Photomask Technology 2009, 748824 (2009) https://doi.org/10.1117/12.829500
Proceedings Volume Photomask Technology 2009, 748825 (2009) https://doi.org/10.1117/12.829622
J. Gramss, R. Galler, V. Neick, A. Stoeckel, U. Weidenmueller, D. Melzer, M. Suelzle, J. Butschke, U. Baetz
Proceedings Volume Photomask Technology 2009, 748827 (2009) https://doi.org/10.1117/12.835880
Simulation and Modeling
Proceedings Volume Photomask Technology 2009, 748828 (2009) https://doi.org/10.1117/12.834787
Proceedings Volume Photomask Technology 2009, 74882A (2009) https://doi.org/10.1117/12.831047
Proceedings Volume Photomask Technology 2009, 74882B (2009) https://doi.org/10.1117/12.829639
Proceedings Volume Photomask Technology 2009, 74882C (2009) https://doi.org/10.1117/12.833464
EUV Mask Contamination and Cleaning
Takeya Shimomura, Ted Liang
Proceedings Volume Photomask Technology 2009, 74882F (2009) https://doi.org/10.1117/12.831272
EUV Mask Data Preparation and Inspection
Proceedings Volume Photomask Technology 2009, 74882G (2009) https://doi.org/10.1117/12.829987
Proceedings Volume Photomask Technology 2009, 74882H (2009) https://doi.org/10.1117/12.829716
Proceedings Volume Photomask Technology 2009, 74882I (2009) https://doi.org/10.1117/12.829748
DPL Implementation and RET Manufacturability
Rani S. Ghaida, George Torres, Puneet Gupta
Proceedings Volume Photomask Technology 2009, 74882J (2009) https://doi.org/10.1117/12.833190
Proceedings Volume Photomask Technology 2009, 74882K (2009) https://doi.org/10.1117/12.829762
Levi Barnes, Yong Li, David Wadkins, Steve Biederman, Alex Miloslavsky, Chris Cork
Proceedings Volume Photomask Technology 2009, 74882L (2009) https://doi.org/10.1117/12.831396
Poster Session: Cleaning/Contamination/Haze
Francesca Perissinotti, Luca Sartelli, Hiroyuki Miyashita, Ming-Chien Chiu, Yu-Chang Liu, Hung-Chieh Chung, Frank Sundermann, Stuart Gough, Sonia Tourniol, et al.
Proceedings Volume Photomask Technology 2009, 74882M (2009) https://doi.org/10.1117/12.830718
Poster Session: EUV Mask
Proceedings Volume Photomask Technology 2009, 74882O (2009) https://doi.org/10.1117/12.829747
Poster Session: Inspection and Repair
Proceedings Volume Photomask Technology 2009, 74882R (2009) https://doi.org/10.1117/12.830083
Proceedings Volume Photomask Technology 2009, 74882S (2009) https://doi.org/10.1117/12.830032
Lev Faivishevsky, Sergey Khristo, Ishai Schwarzband, Shmoolik Mangan
Proceedings Volume Photomask Technology 2009, 74882U (2009) https://doi.org/10.1117/12.829635
Proceedings Volume Photomask Technology 2009, 74882V (2009) https://doi.org/10.1117/12.835948
Poster Session: Mask Data Preparation
Proceedings Volume Photomask Technology 2009, 74882W (2009) https://doi.org/10.1117/12.829247
Proceedings Volume Photomask Technology 2009, 74882X (2009) https://doi.org/10.1117/12.829628
Tejas Jhaveri, Andrzej Strojwas, Larry Pileggi, Vyacheslav Rovner
Proceedings Volume Photomask Technology 2009, 74882Y (2009) https://doi.org/10.1117/12.837240
Poster Session: Mask Process Control/Equipment
Dong-Soo Min, Guen-Ho Hwang, Dong-Heck Lee, Sang-Soo Choi, Hyo-Seok Son, Hyung-Jae Lee, Seung-Mun Son, Kyung-Ho Park
Proceedings Volume Photomask Technology 2009, 74882Z (2009) https://doi.org/10.1117/12.833515
Poster Session: Mask Substrate/Blank/Films
Ju-Hyun Kang, Han-Sun Cha, Sin-Ju Yang, Jin-Ho Ahn, Kee-Soo Nam
Proceedings Volume Photomask Technology 2009, 748830 (2009) https://doi.org/10.1117/12.829878
Poster Session: Metrology
Proceedings Volume Photomask Technology 2009, 748831 (2009) https://doi.org/10.1117/12.833405
Hiroaki Mito, Katsuya Hayano, Tatsuya Maeda, Hiroshi Mohri, Hidetoshi Sato, Ryoichi Matsuoka, Shigeki Sukegawa
Proceedings Volume Photomask Technology 2009, 748832 (2009) https://doi.org/10.1117/12.834229
Poster Session: OPC
Proceedings Volume Photomask Technology 2009, 748835 (2009) https://doi.org/10.1117/12.829393
Moutaz Fakhry, H. Maaty, A. Seoud
Proceedings Volume Photomask Technology 2009, 748836 (2009) https://doi.org/10.1117/12.829714
Yeonah Shim, Sungho Jun, Jaeyoung Choi, Kwangseon Choi, Jae-won Han, Kechang Wang, John McCarthy, Guangming Xiao, Grace Dai, et al.
Proceedings Volume Photomask Technology 2009, 748837 (2009) https://doi.org/10.1117/12.833499
Dominic Reinhard, Puneet Gupta
Proceedings Volume Photomask Technology 2009, 748838 (2009) https://doi.org/10.1117/12.833502
Proceedings Volume Photomask Technology 2009, 74883A (2009) https://doi.org/10.1117/12.829745
M. McCallum, A. Tsiamis, S. Smith, A. C. Hourd, J. T. M. Stevenson, A. J. Walton
Proceedings Volume Photomask Technology 2009, 74883B (2009) https://doi.org/10.1117/12.830053
Poster Session: Pattern Generation/Equipment
Proceedings Volume Photomask Technology 2009, 74883C (2009) https://doi.org/10.1117/12.829630
Poster Session: Simulation and Modeling
Hoyeon Kim, Sung-Woo Lee, Byeongcheol Lee, Sanghwa Lee, Kyoungyong Cho, Seong-Woon Choi, Chan-Hoon Park
Proceedings Volume Photomask Technology 2009, 74883E (2009) https://doi.org/10.1117/12.833345
Hua Song, James Shiely, Irene Su, Lin Zhang, Wen-Kang Lei
Proceedings Volume Photomask Technology 2009, 74883F (2009) https://doi.org/10.1117/12.829725
Proceedings Volume Photomask Technology 2009, 74883G (2009) https://doi.org/10.1117/12.833488
Proceedings Volume Photomask Technology 2009, 74883H (2009) https://doi.org/10.1117/12.829657
Constantin Chuyeshov, Jesus Carrero, Apo Sezginer, Vishnu Kamat
Proceedings Volume Photomask Technology 2009, 74883I (2009) https://doi.org/10.1117/12.833485
Rainer Zimmermann, Martin Schulz, Wolfgang Hoppe, Hans-Jürgen Stock, Wolfgang Demmerle, Alex Zepka, Artak Isoyan, Lars Bomholt, Serdar Manakli, et al.
Proceedings Volume Photomask Technology 2009, 74883J (2009) https://doi.org/10.1117/12.833482
Jaeyoung Choi, Yeonah Shim, Kyunghee Yun, Kwangseon Choi, Jaewon Han
Proceedings Volume Photomask Technology 2009, 74883K (2009) https://doi.org/10.1117/12.833463