PROCEEDINGS VOLUME 8081
PHOTOMASK AND NGL MASK TECHNOLOGY XVIII | 13-15 APRIL 2011
Photomask and Next-Generation Lithography Mask Technology XVIII
Editor(s): Toshio Konishi
Editor Affiliations +
PHOTOMASK AND NGL MASK TECHNOLOGY XVIII
13-15 April 2011
Yokohama, Japan
Front Matter: Volume 8081
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 808101 (2011) https://doi.org/10.1117/12.899897
Materials and Process I
Kei Mesuda, Hiroshi Watanabe, Katsuya Hayano, Eiji Tsujimoto, Hideyoshi Takamizawa, Toshio Ohhashi, Naruo Sakasai, Shintaro Kudo, Tomoyuki Matsuyama
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 808102 (2011) https://doi.org/10.1117/12.899909
FPD Photomasks
Makoto Murai, Masayoshi Tsuchiya, Hiroyuki Shinchi, Terumasa Hirano, Shintaro Kitajima, Yasushi Kaneko, Takahisa Kimoto, Shigeki Takayama
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 808105 (2011) https://doi.org/10.1117/12.897698
Makoto Yonezawa, Seiki Matsumoto, Dongsheng Zhang, Kohei Hashimoto
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 808106 (2011) https://doi.org/10.1117/12.899906
Materials and Process II
Makoto Otani, Hironori Asada, Hosei Tsunoda, Masashi Kunitake, Takehiko Ishizaki, Ryuji Miyagawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 808107 (2011) https://doi.org/10.1117/12.897792
Hiroshi Watanabe, Kei Mesuda, Katsuya Hayano, Eiji Tsujimoto, Hideyoshi Takamizawa, Toshio Ohhashi, Naruo Sakasai, Shintaro Kudo, Tomoyuki Matsuyama
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 808108 (2011) https://doi.org/10.1117/12.899910
Writing Technologies
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 808109 (2011) https://doi.org/10.1117/12.899905
Masaki Kurokawa, Hideaki Isobe, Kenji Abe, Yoshihisa Oae, Akio Yamada, Shogo Narukawa, Mikio Ishikawa, Hiroshi Fujita, Morihisa Hoga, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 80810A (2011) https://doi.org/10.1117/12.897272
Inspection Tools and Technologies I
Hideo Tsuchiya, Fumio Ozaki, Kenichi Takahara, Takafumi Inoue, Nobutaka Kikuiri
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 80810D (2011) https://doi.org/10.1117/12.899487
Metrology Tool and Technologies I
Hiroshi Fukaya, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Hidemitsu Hakii, Isao Yonekura, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 80810G (2011) https://doi.org/10.1117/12.899368
Lithography I
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 80810H (2011) https://doi.org/10.1117/12.897221
DFM, EDA, and MDP
Ryo Tsujimura, Kozo Ogino, Hiromi Hoshino, Shigeo Satoh, Kazumasa Morishita, Satoshi Yoshikawa, Hiroki Futatsuya, Tatsuo Chijimatsu, Satoru Asai, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 80810I (2011) https://doi.org/10.1117/12.899496
Inspection Tools and Technologies II
Tetsuo Harada, Masato Nakasuji, Teruhiko Kimura, Yutaka Nagata, Takeo Watanabe, Hiroo Kinoshita
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 80810K (2011) https://doi.org/10.1117/12.896576
Metrology Tool and Technologies II
Ronald J. Lesnick Jr., Stephen Kim, Matthias Waechter, Dirk Seidel, Andreas Mueller, Dirk Beyer
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 80810L (2011) https://doi.org/10.1117/12.899779
Lithography II
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 80810N (2011) https://doi.org/10.1117/12.899394
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 80810O (2011) https://doi.org/10.1117/12.897531
Kwangok Jeong, Andrew B. Kahng, Christopher J. Progler
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 80810P (2011) https://doi.org/10.1117/12.899295
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 80810Q (2011) https://doi.org/10.1117/12.899899
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 80810R (2011) https://doi.org/10.1117/12.899901
MDP
Aditya Chaudhary, Pierre Bouchard, Kalpesh Dave, Tamer Desouky, Karim Moamen, Mark Simmons
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 80810S (2011) https://doi.org/10.1117/12.897527
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 80810T (2011) https://doi.org/10.1117/12.899900
Kazuyuki Hagiwara, Ingo Bork, Aki Fujimura
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 80810U (2011) https://doi.org/10.1117/12.898862
Mask Repair
Erez Graitzer, Guy Ben-Zvi, Avi Cohen, Dmitriev Vladimir, Dan Avizemer
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 80810V (2011) https://doi.org/10.1117/12.899904
Mask Degradation
Félix Dufaye, Luca Sartelli, Carlo Pogliani, Stuart Gough, Frank Sundermann, Hiroyuki Miyashita, Yoshioka Hidenori, Nathalie Charras, Christophe Brochard, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 80810W (2011) https://doi.org/10.1117/12.898867
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVIII, 80810X (2011) https://doi.org/10.1117/12.899173
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