Proceedings Volume 8880 is from: Logo
SPIE PHOTOMASK TECHNOLOGY
10-12 September 2013
Monterey, California, United States
Front Matter: Volume 8880
Proceedings Volume Photomask Technology 2013, 888001 (2013) https://doi.org/10.1117/12.2035650
Keynote Session
Michael C. Mayberry
Proceedings Volume Photomask Technology 2013, 888002 (2013) https://doi.org/10.1117/12.2032077
Materials and Process I
Banqiu Wu, Ajay Kumar
Proceedings Volume Photomask Technology 2013, 888004 (2013) https://doi.org/10.1117/12.2030487
Paul Dumas, Richard Jenkins, Chuck McFee, Arun J. Kadaksham, Dave K. Balachandran, Ranganath Teki
Proceedings Volume Photomask Technology 2013, 888005 (2013) https://doi.org/10.1117/12.2026372
Simulation, OPC, and Mask Data Preparation I
Proceedings Volume Photomask Technology 2013, 888008 (2013) https://doi.org/10.1117/12.2023093
T. H. Yen, Rick Lai, Laurent C. Tuo, Vikram Tolani, Dongxue Chen, Peter Hu, Jiao Yu, George Hwa, Yan Zheng, et al.
Proceedings Volume Photomask Technology 2013, 88800A (2013) https://doi.org/10.1117/12.2031786
Mask Inspection I
Doug Uzzel, Mark Ma, Shad E. Hedges, Saghir Munir
Proceedings Volume Photomask Technology 2013, 88800B (2013) https://doi.org/10.1117/12.2027913
Crystal Wang, Steven Ho, Eric Guo, Kechang Wang, Suresh Lakkapragada, Jiao Yu, Peter Hu, Vikram Tolani, Linyong Pang
Proceedings Volume Photomask Technology 2013, 88800C (2013) https://doi.org/10.1117/12.2030844
Sung Jae Ryu, Sung Taek Lim, Anthony Vacca, Peter Fiekowsky, Dan Fiekowsky
Proceedings Volume Photomask Technology 2013, 88800D (2013) https://doi.org/10.1117/12.2028275
Proceedings Volume Photomask Technology 2013, 88800E (2013) https://doi.org/10.1117/12.2027307
Simulation, OPC, and Mask Data Preparation II
Proceedings Volume Photomask Technology 2013, 88800F (2013) https://doi.org/10.1117/12.2030733
Proceedings Volume Photomask Technology 2013, 88800G (2013) https://doi.org/10.1117/12.2026468
Weimin Gao, Ardavan Niroomand, Gian F. Lorusso, Robert Boone, Kevin Lucas, Wolfgang Demmerle
Proceedings Volume Photomask Technology 2013, 88800H (2013) https://doi.org/10.1117/12.2027880
Patterning and Double-Patterning Technology
Haitong Tian, Hongbo Zhang, Martin D. F. Wong
Proceedings Volume Photomask Technology 2013, 88800I (2013) https://doi.org/10.1117/12.2026285
Ecron Thompson, Paul Hellebrekers, Paul Hofemann, Dwayne L. LaBrake, Douglas J. Resnick, S. V. Sreenivasan
Proceedings Volume Photomask Technology 2013, 88800J (2013) https://doi.org/10.1117/12.2029275
Mask Industry Survey
Proceedings Volume Photomask Technology 2013, 88800K (2013) https://doi.org/10.1117/12.2033255
Mask Contamination, Cleaning, and Long-Term Durability I
Paul Morgan, Daniel Rost, Daniel Price, Noel Corcoran, Masaki Satake, Peter Hu, Danping Peng, Dean Yonenaga, Vikram Tolani, et al.
Proceedings Volume Photomask Technology 2013, 88800L (2013) https://doi.org/10.1117/12.2027648
Shazad Paracha, Samy Bekka, Benjamin Eynon, Jaehyuck Choi, Mehdi Balooch, Ivin Varghese, Tyler Hopkins
Proceedings Volume Photomask Technology 2013, 88800M (2013) https://doi.org/10.1117/12.2030686
Félix Dufaye, Astrid Sippel, Mark Wylie, Edgardo García-Berríos, Charles Crawford, Carl Hess, Luca Sartelli, Carlo Pogliani, Hiroyuki Miyashita, et al.
Proceedings Volume Photomask Technology 2013, 88800N (2013) https://doi.org/10.1117/12.2029470
Mask Metrology I
Frank Scholze, Victor Soltwisch, Gaoliang Dai, Mark-Alexander Henn, Hermann Gross
Proceedings Volume Photomask Technology 2013, 88800O (2013) https://doi.org/10.1117/12.2025827
A. E. Zweber, A. McGuire, M. Hibbs, S. Nash, K. Ballman, T. Faure, J. Rankin, T. Isogawa, T. Senna, et al.
Proceedings Volume Photomask Technology 2013, 88800P (2013) https://doi.org/10.1117/12.2028909
Proceedings Volume Photomask Technology 2013, 88800Q (2013) https://doi.org/10.1117/12.2027231
Mask Inspection II
Proceedings Volume Photomask Technology 2013, 88800S (2013) https://doi.org/10.1117/12.2027054
Kenneth A. Goldberg, Iacopo Mochi, Markus P. Benk, Chihcheng Lin, Arnaud P. Allezy, Michael Dickinson, Carl W. Cork, James B. Macdougall, Erik H. Anderson, et al.
Proceedings Volume Photomask Technology 2013, 88800T (2013) https://doi.org/10.1117/12.2026496
Hidehiro Watanabe, Ryoichi Hirano, Susumu Iida, Tsuyoshi Amano, Tsuneo Terasawa, Masahiro Hatakeyama, Takeshi Murakami, Shoji Yoshikawa, Kenji Terao
Proceedings Volume Photomask Technology 2013, 88800U (2013) https://doi.org/10.1117/12.2027566
Mask Materials and Process II
M. I. Sanchez, L. K. Sundberg, L. D. Bozano, R. Sooriyakumaran, D. P. Sanders, T. Senna, M. Tanabe, T. Komizo, I. Yoshida, et al.
Proceedings Volume Photomask Technology 2013, 88800V (2013) https://doi.org/10.1117/12.2028753
Richard Wistrom, Yoshifumi Sakamoto, Jeffery Panton, Thomas Faure, Takeshi Isogawa, Anne McGuire
Proceedings Volume Photomask Technology 2013, 88800W (2013) https://doi.org/10.1117/12.2026853
Michael Grimbergen, Madhavi Chandrachood, Jeffrey Tran, Becky Leung, Keven Yu, Amitabh Sabharwal, Ajay Kumar
Proceedings Volume Photomask Technology 2013, 88800X (2013) https://doi.org/10.1117/12.2029006
Wen-Chang Hsueh, Li-Chih Yeh, Ming-Jiun Yao, Yun-Yue Lin, Jia-Jen Chen, Shin-Chang Lee, Anthony Yen
Proceedings Volume Photomask Technology 2013, 88800Y (2013) https://doi.org/10.1117/12.2025786
Mask Contamination, Cleaning, and Long-Term Durability II
Christopher Kossow, Peter Kirlin, Michael Green
Proceedings Volume Photomask Technology 2013, 88800Z (2013) https://doi.org/10.1117/12.2025172
Proceedings Volume Photomask Technology 2013, 888010 (2013) https://doi.org/10.1117/12.2031430
Direct-Write
Proceedings Volume Photomask Technology 2013, 888012 (2013) https://doi.org/10.1117/12.2030684
David K. Lam
Proceedings Volume Photomask Technology 2013, 888013 (2013) https://doi.org/10.1117/12.2030838
Cheng-Hung Chen, Tsung-Chih Chien, P. Y. Liu, W. C. Wang, J. J. Shin, S. J. Lin, Burn J. Lin
Proceedings Volume Photomask Technology 2013, 888014 (2013) https://doi.org/10.1117/12.2029180
2013 JPM Panel Overview
Noriaki Nakayamada, Ichiro Kagami
Proceedings Volume Photomask Technology 2013, 888015 (2013) https://doi.org/10.1117/12.2032072
Mask Manufacturing, and Yield and Mask Business
Proceedings Volume Photomask Technology 2013, 888016 (2013) https://doi.org/10.1117/12.2025569
Zigang Xiao, Yuelin Du, Martin D.F. Wong, Hongbo Zhang
Proceedings Volume Photomask Technology 2013, 888017 (2013) https://doi.org/10.1117/12.2025688
Proceedings Volume Photomask Technology 2013, 888018 (2013) https://doi.org/10.1117/12.2026198
Sergey Babin, Sergey Borisov, Vladimir Militsin, Elena Patyukova
Proceedings Volume Photomask Technology 2013, 888019 (2013) https://doi.org/10.1117/12.2032177
Mask Metrology II
Young-Keun Yoon, Dong Hoon Chung, Min-Ho Kim, Jung-Uk Seo, Byung-Gook Kim, Chan-Uk Jeon, JiUk Hur, Wonil Cho, Tetsuya Yamamoto
Proceedings Volume Photomask Technology 2013, 88801A (2013) https://doi.org/10.1117/12.2025694
Proceedings Volume Photomask Technology 2013, 88801B (2013) https://doi.org/10.1117/12.2027695
Proceedings Volume Photomask Technology 2013, 88801C (2013) https://doi.org/10.1117/12.2029786
Proceedings Volume Photomask Technology 2013, 88801D (2013) https://doi.org/10.1117/12.2031135
Mask Pattern Generators
Christof Klein, Hans Loeschner, Elmar Platzgummer
Proceedings Volume Photomask Technology 2013, 88801E (2013) https://doi.org/10.1117/12.2030772
Russell Cinque, Tadashi Komagata, Taiichi Kiuchi, Clyde Browning, Patrick Schiavone, Paolo Petroni, Luc Martin, Thomas Quaglio
Proceedings Volume Photomask Technology 2013, 88801F (2013) https://doi.org/10.1117/12.2028944
Nobuo Miyamoto, Rodney Kendall, Kenichi Saito
Proceedings Volume Photomask Technology 2013, 88801G (2013) https://doi.org/10.1117/12.2027456
Simulation, OPC, and Mask Data Preparation III
Linyong Pang, Masaki Satake, Ying Li, Peter Hu, Danping Peng, Dongxue Chen, Vikram Tolani
Proceedings Volume Photomask Technology 2013, 88801H (2013) https://doi.org/10.1117/12.2028945
Proceedings Volume Photomask Technology 2013, 88801I (2013) https://doi.org/10.1117/12.2027718
Proceedings Volume Photomask Technology 2013, 88801J (2013) https://doi.org/10.1117/12.2027291
Poster Session
Louis Lin, Wei-Long Wang, Sarah McGowan
Proceedings Volume Photomask Technology 2013, 88801K (2013) https://doi.org/10.1117/12.2022009
Irene Shi, Eric Guo, Eric Tian, Tracy Gu, Forrest Jiang, Sandy Qian, Daisuke Matsushima, Jinyuan Pang
Proceedings Volume Photomask Technology 2013, 88801L (2013) https://doi.org/10.1117/12.2023019
Proceedings Volume Photomask Technology 2013, 88801M (2013) https://doi.org/10.1117/12.2023109
Proceedings Volume Photomask Technology 2013, 88801N (2013) https://doi.org/10.1117/12.2025457
Proceedings Volume Photomask Technology 2013, 88801O (2013) https://doi.org/10.1117/12.2025462
Guoxiang Ning, Selvi Gopalakrishnan, Thomas Thamm, Nikolay Oleynik, Paul Ackmann, Remi Riviere, Stephanie Maelzer, Yee Mei Foong
Proceedings Volume Photomask Technology 2013, 88801P (2013) https://doi.org/10.1117/12.2025466
Kyoil Koo, Gyengseop Kim, Sanghun Kim, Seunghune Yang, Sooryong Lee, Youngchang Kim, Jungdal Choi, Hokyu Kang
Proceedings Volume Photomask Technology 2013, 88801Q (2013) https://doi.org/10.1117/12.2025552
Markus P. Benk, Kenneth A. Goldberg, Iacopo Mochi, Weilun Chao, Erik H. Anderson
Proceedings Volume Photomask Technology 2013, 88801R (2013) https://doi.org/10.1117/12.2025954
Yusin Yang, Yongdeok Jeong, Mitsunori Numata, Mira Park, Mingoo Seo, SangKil Lee, ChungSam Jun, Kyupil Lee, Insoo Cho
Proceedings Volume Photomask Technology 2013, 88801S (2013) https://doi.org/10.1117/12.2025977
Hyo-Jin Ahn, Jong-Min Kim, Dong-Seok Lee, Gyu-Yong Lee, Dong-Heok Lee, Sang-Soo Choi
Proceedings Volume Photomask Technology 2013, 88801T (2013) https://doi.org/10.1117/12.2026123
Proceedings Volume Photomask Technology 2013, 88801U (2013) https://doi.org/10.1117/12.2026140
A. Heinrich, I. Dirnstorfer, J. Bischoff, K. Meiner, U. Richter, T. Mikolajick
Proceedings Volume Photomask Technology 2013, 88801V (2013) https://doi.org/10.1117/12.2026157
D. Beyer, C. Bläsing, K. Boehm, S. Heisig, D. Seidel
Proceedings Volume Photomask Technology 2013, 88801W (2013) https://doi.org/10.1117/12.2026178
Choong Han Ryu, Jae Young Jun, Ho Yong Jung, Sang Pyo Kim, Dong Gyu Yim
Proceedings Volume Photomask Technology 2013, 88801X (2013) https://doi.org/10.1117/12.2026183
Proceedings Volume Photomask Technology 2013, 88801Y (2013) https://doi.org/10.1117/12.2026206
Proceedings Volume Photomask Technology 2013, 88801Z (2013) https://doi.org/10.1117/12.2026213
Proceedings Volume Photomask Technology 2013, 888020 (2013) https://doi.org/10.1117/12.2026423
Iacopo Mochi, Kenneth A. Goldberg, Markus P. Benk, Patrick P. Naulleau
Proceedings Volume Photomask Technology 2013, 888022 (2013) https://doi.org/10.1117/12.2026498
Hongbo Zhang, Qiliang Yan, Lin Zhang, Ebo Croffie, Peter Brooker, Qian Ren, Yongfa Fan
Proceedings Volume Photomask Technology 2013, 888023 (2013) https://doi.org/10.1117/12.2026650
F. Laske, S. Kunitani, T. Kamibayashi, M. Yamana, A. Fuse, M. Wagner, K.-D. Roeth, M. Ferber, M. Daneshpanah, et al.
Proceedings Volume Photomask Technology 2013, 888024 (2013) https://doi.org/10.1117/12.2027200
Avi Cohen, Thomas Trautzsch, Ute Buttgereit, Erez Graitzer, Ori Hanuka
Proceedings Volume Photomask Technology 2013, 888025 (2013) https://doi.org/10.1117/12.2027348
Yaping Sun, Yehua Zuo, Jinyu Zhang, Yan Wang, Zhiping Yu
Proceedings Volume Photomask Technology 2013, 888026 (2013) https://doi.org/10.1117/12.2027487
Natalia Davydova, Robert de Kruif, Hiroaki Morimoto, Yo Sakata, Jun Kotani, Norihito Fukugami, Shinpei Kondo, Tomohiro Imoto, Brid Connolly, et al.
Proceedings Volume Photomask Technology 2013, 888027 (2013) https://doi.org/10.1117/12.2027596
Masahiro Hatakeyama, Takeshi Murakami, Kenji Terao, Kenji Watanabe, Shoji Yoshikawa, Tsuyoshi Amano, Ryoichi Hirano, Susumu Iida, Tsuneo Terasawa, et al.
Proceedings Volume Photomask Technology 2013, 888028 (2013) https://doi.org/10.1117/12.2027733
Proceedings Volume Photomask Technology 2013, 888029 (2013) https://doi.org/10.1117/12.2027766
Proceedings Volume Photomask Technology 2013, 88802A (2013) https://doi.org/10.1117/12.2027825
Rene A. Claus, Iacopo Mochi, Markus P. Benk, Kenneth A. Goldberg, Andrew R. Neureuther, Patrick P. Naulleau
Proceedings Volume Photomask Technology 2013, 88802B (2013) https://doi.org/10.1117/12.2027828
Proceedings Volume Photomask Technology 2013, 88802D (2013) https://doi.org/10.1117/12.2027843
Hideo Kobayashi, Hiromasa Iyama, Takeshi Kagatsume, Takashi Sato, Shuji Kishimoto, Tsuyoshi Watanabe
Proceedings Volume Photomask Technology 2013, 88802E (2013) https://doi.org/10.1117/12.2027870
Ying Li, Masaki Satake, Danping Peng, Peter Hu, Linyong Pang
Proceedings Volume Photomask Technology 2013, 88802G (2013) https://doi.org/10.1117/12.2031092
S. Martens, J. Butschke, R. Galler, M. Krüger, H. Sailer, M. Sülzle
Proceedings Volume Photomask Technology 2013, 88802H (2013) https://doi.org/10.1117/12.2030822
Proceedings Volume Photomask Technology 2013, 88802I (2013) https://doi.org/10.1117/12.2030819
Takuya Tao, Nobuyasu Takahashi, Masakazu Hamaji
Proceedings Volume Photomask Technology 2013, 88802J (2013) https://doi.org/10.1117/12.2030796
Dongbing Shao, Bidan Zhang, Shayak Banerjee, Hong Kry, Anuja De Silva, Ranee Kwong, Kisup Chung, Yea-Sen Lin, Alan Leslie
Proceedings Volume Photomask Technology 2013, 88802L (2013) https://doi.org/10.1117/12.2029356
Proceedings Volume Photomask Technology 2013, 88802M (2013) https://doi.org/10.1117/12.2033258
Proceedings Volume Photomask Technology 2013, 88802N (2013) https://doi.org/10.1117/12.2033257
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