Poster + Presentation
13 June 2022 Construction and commissioning of cERL IR-FEL for realizing the EUV-FEL for future lithography
Author Affiliations +
Conference Poster
Abstract
An ERL-based EUV-FEL can provide EUV power of more than 1 kW for multiple scanners to overcome stochastic effects with a higher throughput. An IR-FEL project started at the KEK cERL as a NEDO project in order to develop high-power IR lasers for high-efficiency laser processing, and it can demonstrate proof of concept of the EUV-FEL for future lithography. The IR-FEL was constructed in May 2020 and commissioned in June to July 2020 and in February to March 2021. We will briefly review the EUV-FEL and present the construction and commissioning of the cERL IR-FEL for realizing the EUV-FEL for future lithography.
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Norio Nakamura, Ryukou Kato, Hiroshi Sakai, Kimichika Tsuchiya, Yasunori Tanimoto, Yosuke Honda, Tsukasa Miyajima, Miho Shimada, Takashi Obina, and Hiroshi Kawata "Construction and commissioning of cERL IR-FEL for realizing the EUV-FEL for future lithography", Proc. SPIE PC12051, Optical and EUV Nanolithography XXXV, PC120510S (13 June 2022); https://doi.org/10.1117/12.2613617
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KEYWORDS
Lithography

Free electron lasers

Extreme ultraviolet

Infrared radiation

Laser development

Light sources

Machine learning

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