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30 April 2023 Chemically tailored block copolymers based on polystyrene-b-polymethacrylates for DSA patterning
Teruaki Hayakawa, Shinsuke Maekawa, Yuta Nabae, Takehiro Seshimo, Takahiro Dazai, Kazufumi Sato
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Proceedings Volume PC12497, Novel Patterning Technologies 2023; PC124970G (2023) https://doi.org/10.1117/12.2662125
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States
Abstract
We have developed strongly-segregating chemically tailored block copolymers (BCPs), a series of post-functionalized polystyrene-b-polymethacrylates that can form sub-10 nm perpendicular lamellae on thin films by thermal annealing. The desired BCPs successfully synthesized by thiol-epoxy reaction of poly(glycidyl methacrylate)s, a partial component of polystyrene-b-polymethacrylates, with trifluoroethane thiol. Microdomains in the obtained BCP thin films were vertically oriented by tuning the Neutral Layer, and highly aligned and distinct vertical lamellae with L0=15.1 nm were successfully obtained on the guide pattern substrate for DSA.
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Teruaki Hayakawa, Shinsuke Maekawa, Yuta Nabae, Takehiro Seshimo, Takahiro Dazai, and Kazufumi Sato "Chemically tailored block copolymers based on polystyrene-b-polymethacrylates for DSA patterning", Proc. SPIE PC12497, Novel Patterning Technologies 2023, PC124970G (30 April 2023); https://doi.org/10.1117/12.2662125
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KEYWORDS
Optical lithography
Annealing
Lithography
Scanning electron microscopy
Thin films
Transmission electron microscopy
Polymerization
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