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4 October 2023 Upgrade of the LCLS optics metrology stitching measurement capability
May Ling Ng, Lance Lee
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Proceedings Volume PC12695, Advances in Metrology for X-Ray and EUV Optics X; PC1269503 (2023) https://doi.org/10.1117/12.2676843
Event: SPIE Optical Engineering + Applications, 2023, San Diego, California, United States
Abstract
The LCLS-II HE Project includes the upgrade of the x-ray beam transport line for DXS, CXI and MFX, which requires an additional 10 bendable mirror systems. For meeting the project demand, the LCLS Metrology Laboratory has added another set of instrumentation to perform stitching measurement using a Zygo 6” DynaFiz (Fizeau interferometer). Prior to the upgrade, the lab has one stitching setup for measuring horizontally facing mirrors, up to 1.5 m long. This new setup enables the measurement of vertically facing mirrors up to 1.2 m long. The measuring systems allow the incorporation of environmental logging as well as control of mirror mechanics such as bender actuators. This means the lab can manipulate two mirror systems and perform the measurements simultaneously, independently and fully automatically. The performance and repeatability of the new instrumentation will be presented. An example measurement of a pair of LCLS mirrors will be discussed.
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May Ling Ng and Lance Lee "Upgrade of the LCLS optics metrology stitching measurement capability", Proc. SPIE PC12695, Advances in Metrology for X-Ray and EUV Optics X, PC1269503 (4 October 2023); https://doi.org/10.1117/12.2676843
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KEYWORDS
Liquid crystal lasers
Mirrors
Metrology
Actuators
Control systems
Environmental sensing
Fizeau interferometers
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