Sustainable semiconductor manufacturing with a focus on lithography

Emily E. Gallagher

doi:10.1117/12.3013557

10 April 2024 Sustainable semiconductor manufacturing with a focus on lithography

Emily E. Gallagher

Proceedings Volume PC12956, Novel Patterning Technologies 2024; PC1295601 (2024) https://doi.org/10.1117/12.3013557
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

Sustainable practices, no matter the context, demand a quantitative assessment of environmental impacts. To provide that information, imec has developed a cradle-to-gate life cycle analysis of logic technology nodes based on bottom-up modeling of a generic high-volume semiconductor fabrication fab. Tool data, process recipes, and integrated wafer process flows are extracted from imec’s fab and partner data. The resultant virtual fab is used to identify major process contributors to emissions, to provide sensitivity analysis, and to enable future patterning decisions with a quantification of their environmental ramifications. Overall technology data will be shown, but as a more targeted example, the introduction of low and high NA EUV lithography will be studied. Key patterning parameters like mask design choices, wafer dose and patterning approaches are varied to quantify sensitivity to these choices. In the end, sustainability is driven by understanding the impact of these decisions throughout the supply chain. You will learn among other things, whether high NA is a sustainable choice or not.

Conference Presentation

Citation Download Citation

Emily E. Gallagher "Sustainable semiconductor manufacturing with a focus on lithography", Proc. SPIE PC12956, Novel Patterning Technologies 2024, PC1295601 (10 April 2024); https://doi.org/10.1117/12.3013557

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KEYWORDS

Sustainability

Lithography

Semiconductor manufacturing

Optical lithography

Data modeling

Semiconducting wafers

Logic

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