Lithography With Metallo-Organic Resists

A. C. Pastor; R. C. Pastor; M. Braunstein; G. L. Tangonan

doi:10.1117/12.965629

10 February 1981 Lithography With Metallo-Organic Resists

A. C. Pastor, R. C. Pastor, M. Braunstein, G. L. Tangonan

Proceedings Volume 0240, Periodic Structures, Gratings, Moire Patterns, and Diffraction Phenomena I; (1981) https://doi.org/10.1117/12.965629
Event: 24th Annual Technical Symposium, 1980, San Diego, United States

Abstract

Photolithography with metallo-organic resists is a relatively new addition to photo-engraving technology, and involves the chemical incorporation of inorganic constituents into photopolymerizable organic compounds, so that the photoresist functions not merely as a masking material, as in conventional photolithography, but also as the mass transference vehicle itself. The deposition of thin structured films of metal oxides with this method has been accomplished, the metal-doped resist in each case being the metal acrylate in acrylic acid, except in those cases where the metal acrylate was insoluble. Polymerization was effected with uv irradiation. The criteria for depositing other classes of inorganic compounds are outlined.

Citation Download Citation

A. C. Pastor, R. C. Pastor, M. Braunstein, and G. L. Tangonan "Lithography With Metallo-Organic Resists", Proc. SPIE 0240, Periodic Structures, Gratings, Moire Patterns, and Diffraction Phenomena I, (10 February 1981); https://doi.org/10.1117/12.965629

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