Paper
17 June 1981 The Effect Of Overcoats On The Ablative Writing Characteristics Of Tellurium Films
M. Chen, V. Marrello
Author Affiliations +
Proceedings Volume 0263, Optical Storage Materials; (1981) https://doi.org/10.1117/12.965678
Event: Optical Storage Materials, 1980, New York, United States
Abstract
The change in the ablative writing sensitivity of Te films due to SiO2 and polymethyl methacrylate overcoats of various thicknesses were measured. These experimental data were compared to results of thermal calculations. We found that thermal losses of the absorbed laser energy to the overcoat layer is usually not negligible even for very thin (≤5500 Å thick) overcoat layers. In addition to thermal effects which degrade the writing sensitivity of Te films, we found that rigid overcoats combined with rigid substrates can constrain the ablative writing process of Te and hence cause further degradation in the writing sensitivity and in the read-during-write signal.
© (1981) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. Chen and V. Marrello "The Effect Of Overcoats On The Ablative Writing Characteristics Of Tellurium Films", Proc. SPIE 0263, Optical Storage Materials, (17 June 1981); https://doi.org/10.1117/12.965678
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KEYWORDS
Tellurium

Silica

Polymethylmethacrylate

Glasses

Pulsed laser operation

Silicon carbide

Krypton

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