Intense Plasma Source For X-Ray Microscopy

Robert A. Gutcheck; Julius J. Muray

doi:10.1117/12.933154

24 March 1982 Intense Plasma Source For X-Ray Microscopy

Robert A. Gutcheck, Julius J. Muray

Proceedings Volume 0316, High Resolution Soft X-Ray Optics; (1982) https://doi.org/10.1117/12.933154
Event: 1981 Brookhaven Conferences, 1981, Upton, United States

Abstract

A pulsed soft x-ray source for use in contact microscopy would provide high-resolution, high-contrast images with minimal radiation damage to the biological specimen involved. An x-ray plasma source offers some advantages over synchrotron radiation in terms of smaller physical size, lower cost, larger beam size, and higher flux per pulse. The operation of a pulsed plasma focus device is described and this system is compared to other plasma sources. Results of a radiation model calculation predict that the use of neon gas would produce 1.2- to 1.4-nm radiation in 50- to 100-J pulses (emitted into 47 sterradians) with an efficiency of 1%. The actual source is about 2 mm in diameter and the x-ray pulse lasts about 15 to 20 ns. By choosing the proper gas or electrode material, one can generate a combination of emission lines that cover the region between the carbon edge (300 eV) to 2 keV. The system operates in the pressure range of a few torr. With the x-ray resists being developed for submicron x-ray lithography, microradiographs can be produced that have resolutions of 0.1 pm. The intense pulsed output can provide enough flux to make possible the micrography of wet or alive specimens.

Citation Download Citation

Robert A. Gutcheck and Julius J. Muray "Intense Plasma Source For X-Ray Microscopy", Proc. SPIE 0316, High Resolution Soft X-Ray Optics, (24 March 1982); https://doi.org/10.1117/12.933154

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