Shaped Beams For Integrated Circuit Fabrication

Edward V. Weber

doi:10.1117/12.933418

30 June 1982 Shaped Beams For Integrated Circuit Fabrication

Edward V. Weber

Proceedings Volume 0333, Submicron Lithography I; (1982) https://doi.org/10.1117/12.933418
Event: 1982 Microlithography Conferences, 1982, Santa Clara, United States

Abstract

Shaped E-Beam systems have superior writing speed for a given resolution requirement by virtue of their ability to expose numerous pattern elements in parallel. The added optic elements and circuitry for shaping makes the systems somewhat more complex than gaussian spot systems however, this is compensated by the lower circuit operating speeds and greater flexibility.

Citation Download Citation

Edward V. Weber "Shaped Beams For Integrated Circuit Fabrication", Proc. SPIE 0333, Submicron Lithography I, (30 June 1982); https://doi.org/10.1117/12.933418

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