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28 November 1983 Multilayer Antireflection Coatings (ARCs) : A Versatile Method For Design And Optimisation
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Proceedings Volume 0401, Thin Film Technologies I; (1983) https://doi.org/10.1117/12.935513
Event: 1983 International Technical Conference/Europe, 1983, Geneva, Switzerland
Abstract
A generalised scheme for designing non-quarter wave higher order multilayer ARC systems is developed. In this scheme, one or more than one layer of the initial single/double/ triple layer system, are considered as Herpin equivalent layer and exact optical thicknesses of the constituent layers are calculated. It is seen that the method can yield broad band ARCs and thickness corrections can be applied under in situ conditions. A four layer ARC system, designed and optimised by this method has reflection losses less than 0.5% over a spectral range of 6.55 - 11.25 micrometres.
© (1983) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C. L. Nagendra and G. K. M. Thutupalli "Multilayer Antireflection Coatings (ARCs) : A Versatile Method For Design And Optimisation", Proc. SPIE 0401, Thin Film Technologies I, (28 November 1983); https://doi.org/10.1117/12.935513
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