Ultrasensitive Elemental Analysis Of Solids By Sputter Initiated Resonance Ionization Spectroscopy

J. E. Parks; H. W. Schmitt; G. S. Hurst; W. M. Fairbank Jr.

doi:10.1117/12.936233

19 October 1983 Ultrasensitive Elemental Analysis Of Solids By Sputter Initiated Resonance Ionization Spectroscopy

J. E. Parks, H. W. Schmitt, G. S. Hurst, W. M. Fairbank Jr.

Proceedings Volume 0426, Laser-Based Ultrasensitive Spectroscopy and Detection V; (1983) https://doi.org/10.1117/12.936233
Event: 27th Annual Technical Symposium, 1983, San Diego, United States

Abstract

This paper describes a new technique, Sputter-Initiated Resonance Ionization Spectroscopy (SIRIS)t, for ultrasensitive elemental analysis of solid samples. SIRIS combines resonance ionization spectroscopy and ion beam sputtering to provide analyses for all the elements except helium and neon with predicted sensitivities down to 1 part in 1012 in routine analysis, and greater for special uses. Basic concepts of this technology and new results in the development of the new SIRIS process and apparatus are presented.

Citation Download Citation

J. E. Parks, H. W. Schmitt, G. S. Hurst, and W. M. Fairbank Jr. "Ultrasensitive Elemental Analysis Of Solids By Sputter Initiated Resonance Ionization Spectroscopy", Proc. SPIE 0426, Laser-Based Ultrasensitive Spectroscopy and Detection V, (19 October 1983); https://doi.org/10.1117/12.936233

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