Applications Of The Square Count Yield Model

A Marsh

doi:10.1117/12.941886

29 June 1984 Applications Of The Square Count Yield Model

A Marsh

Proceedings Volume 0470, Optical Microlithography III: Technology for the Next Decade; (1984) https://doi.org/10.1117/12.941886
Event: 1984 Microlithography Conferences, 1984, Santa Clara, United States

Abstract

Yield data presented both for meander tracks and for contact chains show that the latter are considerably more vulnerable to defects involved in wafer processing, especially at the smaller feature sizes. A yield model, which is extended to cater for this difference, is applied to aspects of the scaling of integrated circuits.

Citation Download Citation

A Marsh "Applications Of The Square Count Yield Model", Proc. SPIE 0470, Optical Microlithography III: Technology for the Next Decade, (29 June 1984); https://doi.org/10.1117/12.941886

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