Paper
27 March 1985 Diffraction Limited Photogrammetry With The NPL Centrax Camera System
J. M. Burch, C. Forno
Author Affiliations +
Proceedings Volume 0492, 1984 European Conf on Optics, Optical Systems, and Applications; (1985) https://doi.org/10.1117/12.943704
Event: 1984 European Conference on Optics, Optical Systems and Applications, 1984, Amsterdam, Netherlands
Abstract
The NPL Centrax camera has been designed for ultra-precise work in close range photogrammetry. For this type of application it is seldom satisfactory to rely on natural object features, such as surface texture or edges, and in most cases specially designed targets are used to define the points being studied. If these targets are made small, symmetric and self-luminous, then it becomes a useful alternative to dispense with conventional photographic imaging and to redesign the lens so that the images which it produces, although larger than usual, have their positions sharply defined by a central diffraction pattern. These central patterns are referred to as "axicon images"; each of them contains a small bright spot surrounded by several concentric diffraction rings of almost regular spacing and gradually decaying intensity (Figure 1).
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. M. Burch and C. Forno "Diffraction Limited Photogrammetry With The NPL Centrax Camera System", Proc. SPIE 0492, 1984 European Conf on Optics, Optical Systems, and Applications, (27 March 1985); https://doi.org/10.1117/12.943704
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KEYWORDS
Cameras

Photography

Axicons

Nanolithography

Diffraction

Microscopes

Photogrammetry

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