Methods Of Characterizing Photorefractive Susceptibility Of LiNbO[sub]3[/sub] Waveguides

R. A. Becker

doi:10.1117/12.950740

11 September 1985 Methods Of Characterizing Photorefractive Susceptibility Of LiNbO₃ Waveguides

R. A. Becker

Proceedings Volume 0578, Integrated Optical Circuit Engineering II; (1985) https://doi.org/10.1117/12.950740
Event: 1985 Cambridge Symposium, 1985, Cambridge, United States

Abstract

Two methods for measuring the photorefractive susceptibility of LiNb0₃ waveguides are reviewed. Data for waveguides formed by means of Ti indiffusion and also by proton exchange techniques are discussed. The photorefractive effect in channel-waveguide devices is analyzed by means of a model which accurately predicts the time evolution of photorefrac-tive effects. The response of guided-wave Mach-Zehnder interferometers is experimentally evaluated, and the magnitudes of the photovoltaic and photoconductive components which com-prise the photorefractive effect are quantitatively determined. While these initial results were obtained for channel-waveguide devices, the model is believed to be extendable to planar-waveguide devices as well.

Citation Download Citation

R. A. Becker "Methods Of Characterizing Photorefractive Susceptibility Of LiNbO₃ Waveguides", Proc. SPIE 0578, Integrated Optical Circuit Engineering II, (11 September 1985); https://doi.org/10.1117/12.950740

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