An Evaporation Monitoring System featuring "Software" Trigger Points and On line Evaluation of Refractive Indices

Christian Schroedter

doi:10.1117/12.938352

13 October 1986 An Evaporation Monitoring System featuring "Software" Trigger Points and On line Evaluation of Refractive Indices

Christian Schroedter

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Proceedings Volume 0652, Thin Film Technologies II; (1986) https://doi.org/10.1117/12.938352
Event: 1986 International Symposium/Innsbruck, 1986, Innsbruck, Austria

Abstract

A microcomputer based evaporation monitoring system is presented which operates on a standard production plant equipped with standard thin film measuring devices: photometer and quartz crystal monitor. The computer acts as an evaporation data acquisition and storage system. The transmission T of a sample substrate as well as the film thickness d taken from the quartz monitor are recorded digitally vs. time. The T-d relation is on line least-squares fitted to the theoretical T-d function of an arbitrary nonabsorbing homogeneous layer deposited on an arbitrary stack. Using the fit function an optical thickness can be expressed in terms of the linear parameter d for instance as trigger point for termination of the deposition process. The procedure is especially suitable in turning points. In non-absorbing systems the fit function directly yields the refractive index of the layer.

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Christian Schroedter "An Evaporation Monitoring System featuring "Software" Trigger Points and On line Evaluation of Refractive Indices", Proc. SPIE 0652, Thin Film Technologies II, (13 October 1986); https://doi.org/10.1117/12.938352

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