Capability Of Kinetic Ellipsometry As An In Situ Control System For Ultra Thin Layers Stacks Growth: Application To The Realization Of Performant Soft X Ray Optics

P. Houdy; V. Bodart; L. Nevot; D. Corno; B. Pardo; M. Arbaoui; N. Alehyane; R. Barchewitz; Y. Lepetre; E. Ziegler

doi:10.1117/12.964832

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9 April 1987 Capability Of Kinetic Ellipsometry As An In Situ Control System For Ultra Thin Layers Stacks Growth: Application To The Realization Of Performant Soft X Ray Optics

P. Houdy, V. Bodart, L. Nevot, D. Corno, B. Pardo, M. Arbaoui, N. Alehyane, R. Barchewitz, Y. Lepetre, E. Ziegler

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Proceedings Volume 0688, Multilayer Structures & Laboratory X-Ray Laser Research; (1987) https://doi.org/10.1117/12.964832
Event: 30th Annual Technical Symposium, 1986, San Diego, United States

Abstract

Diode RF sputtering technique has been used to produce carbon tungsten ultra thin layers stacks for application in the soft X-ray donain as optical system. In situ kinetic ellipsometry has been chooser to control the multilayers growth with a great accuracy. Grazing X-ray reflection (1.54 Å), absolute soft X-ray reflectivity (44.7 Å) and electron microscopy results confirm a posteriori the ellipsometry capabili-ties. The stacks have low roughness (2 Å) and low periodicity errors (2 %), 13 % experimental reflectivity instead of 20 % theoretical (2 d = 90 Å) and 7 % instead of 12 % (2 d = 60 Å) have been obtained.

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P. Houdy, V. Bodart, L. Nevot, D. Corno, B. Pardo, M. Arbaoui, N. Alehyane, R. Barchewitz, Y. Lepetre, and E. Ziegler "Capability Of Kinetic Ellipsometry As An In Situ Control System For Ultra Thin Layers Stacks Growth: Application To The Realization Of Performant Soft X Ray Optics", Proc. SPIE 0688, Multilayer Structures & Laboratory X-Ray Laser Research, (9 April 1987); https://doi.org/10.1117/12.964832

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