Exposure Matching Of Polychromatic Exposure Systems

William A. Keese

doi:10.1117/12.967047

1 January 1987 Exposure Matching Of Polychromatic Exposure Systems

William A. Keese

Proceedings Volume 0772, Optical Microlithography VI; (1987) https://doi.org/10.1117/12.967047
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

It has been a long-standing goal of lithography engineers to match their exposure systems, using an independent monitor, such that a single exposure setting would deliver an identical effect to photoresist from any of their machines at any time. This is a relatively trivial issue for monochromatic systems, since both the photoresist and the detector system are unaffected by spectral sensitivities. However, the problem becomes more complex in the case of polychromatic systems such as the Perkin-Elmer aligner or the Ultratech Stepper. This paper outlines some of the considerations in pursuing this goal, and describes the implementation of such a system in a manufacturing facility utilizing polychromatic wafer stepper systems.

Citation Download Citation

William A. Keese "Exposure Matching Of Polychromatic Exposure Systems", Proc. SPIE 0772, Optical Microlithography VI, (1 January 1987); https://doi.org/10.1117/12.967047

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