Paper
1 January 1987 Liquid Particle Counting - Part Ii Methodology Development And Statistical Process Control
Jeffrey K. Hecht, Edward J. Reardon, Douglas A. Thompson
Author Affiliations +
Abstract
Liquid particle counting (LPC) based upon laser light scattering technology continues to find wide applications in semiconductor manufacturing. Because defect levels in semiconductor devices are related to cleanliness of the processing chemicals, both users and vendors of photoresists and auxiliaries have expended efforts toward LPC testing programs. This paper describes Dynachem's approach to solving problems that have made vendor-user correlations difficult and have prevented setting of meaningful specifications. The paper also discusses how statistical process control can be applied to production of photoresists and developers. As demonstrated in the following discussions, the combination of statistical process control and particulate analysis is powerful and should help vendors and users move toward their goals of specification development.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jeffrey K. Hecht, Edward J. Reardon, and Douglas A. Thompson "Liquid Particle Counting - Part Ii Methodology Development And Statistical Process Control", Proc. SPIE 0772, Optical Microlithography VI, (1 January 1987); https://doi.org/10.1117/12.967049
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KEYWORDS
Particles

Photoresist materials

Process control

Liquids

Optical lithography

Photoresist developing

Statistical analysis

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