Growth Of Gallium Nitride On Silicon Carbide By Molecular Beam Epitaxy

M J Paisley; Z Sitar; C H Carter; R F Davis

doi:10.1117/12.943932

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18 May 1988 Growth Of Gallium Nitride On Silicon Carbide By Molecular Beam Epitaxy

M J Paisley, Z Sitar, C H Carter, R F Davis

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Proceedings Volume 0877, Micro-Optoelectronic Materials; (1988) https://doi.org/10.1117/12.943932
Event: 1988 Los Angeles Symposium: O-E/LASE '88, 1988, Los Angeles, CA, United States

Abstract

Gallium nitride (GaN) is a compound semicon-ductor with a direct, wide bandgap (3.5 eV at 300K) and a large saturated electron drift veloc-ity. This unique combination of properties pro-vides the potential for fabrication of short wave-length (near UV and blue) semiconductor lasers, LEDs and detectors as well as transit-time-limited (IMPATT, etc.) microwave power amplifiers from this material. However, all GaN previously pro-duced has possessed a high n-type carrier concen-tration which has limited its potential. This phenomenon has been almost invariably associated with the presence of nonequilibrium nitrogen va-cancies. This paper reports growth of GaN by mod-ified MBE techniques in order to reduce the nitro-gen vacancies. The primary advantages of these MBE-based techniques are low growth temperature and high nitrogen activity. A standard effusion cell was used for the gallium source, but for ni-trogen, a microwave glow discharge was used to ac-tivate the nitrogen prior to deposition. The films were deposited on (100) 3-SiC and (0001) Al203 substrates. Growth results and preliminary film characterization will be presented.

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M J Paisley, Z Sitar, C H Carter, and R F Davis "Growth Of Gallium Nitride On Silicon Carbide By Molecular Beam Epitaxy", Proc. SPIE 0877, Micro-Optoelectronic Materials, (18 May 1988); https://doi.org/10.1117/12.943932

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