Plasma Sources For Development Of Growth Techniques For Diamond-Like Coatings

C C Tsai; F W Baity; W K Dagenhart; W L Gardner; H H Haselton; D E Schechter; W L Stirling

doi:10.1117/12.943939

18 May 1988 Plasma Sources For Development Of Growth Techniques For Diamond-Like Coatings

C C Tsai, F W Baity, W K Dagenhart, W L Gardner, H H Haselton, D E Schechter, W L Stirling

Proceedings Volume 0877, Micro-Optoelectronic Materials; (1988) https://doi.org/10.1117/12.943939
Event: 1988 Los Angeles Symposium: O-E/LASE '88, 1988, Los Angeles, CA, United States

Abstract

Thin, pure, hard carbon films about 1 pm thick have been deposited on a water-cooled copper plate installed in a continuous-wave (cw) plasma source with graphite walls. The transparent, glassy films were observed after several thousand multisecond pulses of intense hydrogen discharges. The properties of these films and the operating conditions of the plasma, source are described. Many ion beam and rf sources are available in the Fusion Energy Division of the Oak Ridge National Laboratory (ORNL). The potential application of these plasma sources to growing large, thick diamond films is discussed.

Citation Download Citation

C C Tsai, F W Baity, W K Dagenhart, W L Gardner, H H Haselton, D E Schechter, and W L Stirling "Plasma Sources For Development Of Growth Techniques For Diamond-Like Coatings", Proc. SPIE 0877, Micro-Optoelectronic Materials, (18 May 1988); https://doi.org/10.1117/12.943939

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