A Novel Dry Develop Method Of Photoresist - "Unzipping Development" By Flood UV Irradiation

Hayato Katsuragi; Masao Miyazaki; Norio Ishikawa; Kiyoto Mori; Hitomi Yamada; Shinzo Morita; Shuzo Hattori

doi:10.1117/12.968321

1 January 1988 A Novel Dry Develop Method Of Photoresist - "Unzipping Development" By Flood UV Irradiation

Hayato Katsuragi, Masao Miyazaki, Norio Ishikawa, Kiyoto Mori, Hitomi Yamada, Shinzo Morita, Shuzo Hattori

Proceedings Volume 0920, Advances in Resist Technology and Processing V; (1988) https://doi.org/10.1117/12.968321
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

A novel dry develop method of photoresist - "unzipping development" by flood UV irradiation is described. Evaluated resist consisted of poly-methyl methacrylate (PMMA) and unzipping inhibitors such as p-benzoquinone (p-BQ) and 4,4'-diazide diphenylmethane(4,4'-DDM). As a preliminary experiment has shown that 4,4'-DDM was superior to p-BQ as an unzipping inhibitor, a resist : PMMA added with 40 wt% was mainly evaluated. At patterning exposure (600 ~ 1200 mJ/m2 at 210 ~ 280 nm), 4,4'-DDM in the exposed area fixed into polymer. Then, 4,4'-DDM in the unexposed area was removed in vacuo (0.4 mmHg at 120°C for 1 hr). Finally, negative resist pattern of 1.6 μm was developed by flood UV irradiation (24 J/cm2 at 254 nm) at 90 ~ 130°C without using any solvent. Mechanistic studies were carried out by using IR and UV analyses.

Citation Download Citation

Hayato Katsuragi, Masao Miyazaki, Norio Ishikawa, Kiyoto Mori, Hitomi Yamada, Shinzo Morita, and Shuzo Hattori "A Novel Dry Develop Method Of Photoresist - "Unzipping Development" By Flood UV Irradiation", Proc. SPIE 0920, Advances in Resist Technology and Processing V, (1 January 1988); https://doi.org/10.1117/12.968321

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
8 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Ultraviolet radiation

Absorption

Optical lithography

Polymethylmethacrylate

Polymers

Photoresist developing

Etching

Show All Keywords

Keywords/Phrases

Search In:

Publication Years