Aqueous Developable, Negative Working Resist Made Of Chlorinated Novolac Resin

H. Hiraoka; A. Patlach; Kaolin N. Chiong; Daniel Seligson; Piero Pianetta

doi:10.1117/12.968310

1 January 1988 Aqueous Developable, Negative Working Resist Made Of Chlorinated Novolac Resin

H. Hiraoka, A. Patlach, Kaolin N. Chiong, Daniel Seligson, Piero Pianetta

Proceedings Volume 0920, Advances in Resist Technology and Processing V; (1988) https://doi.org/10.1117/12.968310
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

Recently, three approaches to sub-micron imaging using negative working, aqueous developable, novolac resin or poly(hydroxystyrene)-based resists have been reported: (1) Image reversal of positive working photoresists (2) Acid hardenable resist with post-bake process, and (3) Contrast enhanced-resist with deep uv flood exposure. Negative working resists with high resolution are important for fabrication of advanced devices. In the present study we examine a simple two component system consisting of a chlorinated novolac resin and an aromatic bisazide suitable for uv, electron and x-ray exposure. The resist is conventionally processed in aqueous developer, and provides negative working resist images with 0.25 μm space and line resolution without swelling or scum.

Citation Download Citation

H. Hiraoka, A. Patlach, Kaolin N. Chiong, Daniel Seligson, and Piero Pianetta "Aqueous Developable, Negative Working Resist Made Of Chlorinated Novolac Resin", Proc. SPIE 0920, Advances in Resist Technology and Processing V, (1 January 1988); https://doi.org/10.1117/12.968310

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