New 2-Diazocyclohexane-1,3-Dione Photoactive Compounds For Deep U.V. Lithography

George Schwartzkopf

doi:10.1117/12.968301

1 January 1988 New 2-Diazocyclohexane-1,3-Dione Photoactive Compounds For Deep U.V. Lithography

George Schwartzkopf

Proceedings Volume 0920, Advances in Resist Technology and Processing V; (1988) https://doi.org/10.1117/12.968301
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

The title compounds have been examined as photoactive components of two-part deep UV photoresists. All of the materials synthesized were soluble in typical photoresist solvents. Some were completely retained in photoresist layers baked at 95°C. The dependence of diazo compound retention on structure is discussed. Typical UV spectra of these photoresists are shown as well as the changes that occur on deep UV irradiation. Examples of typical development curves and PROSIM resist profiles are shown.

Citation Download Citation

George Schwartzkopf "New 2-Diazocyclohexane-1,3-Dione Photoactive Compounds For Deep U.V. Lithography", Proc. SPIE 0920, Advances in Resist Technology and Processing V, (1 January 1988); https://doi.org/10.1117/12.968301

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