Study Of The Reaction Kinetics Of The Photoresist Aging Process

Thiloma Perera; Michael P. C. Watts

doi:10.1117/12.968317

1 January 1988 Study Of The Reaction Kinetics Of The Photoresist Aging Process

Thiloma Perera, Michael P. C. Watts

Proceedings Volume 0920, Advances in Resist Technology and Processing V; (1988) https://doi.org/10.1117/12.968317
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

The aim of this work was to determine the effect of aging on absorption, thickness and dissolution characteristics of precoated photoresist blanks. Experimental results indicate that the aging of photoresist involves bleaching and darkening reactions. The temperature dependency of these reactions follow the Arrhenius Law.

Citation Download Citation

Thiloma Perera and Michael P. C. Watts "Study Of The Reaction Kinetics Of The Photoresist Aging Process", Proc. SPIE 0920, Advances in Resist Technology and Processing V, (1 January 1988); https://doi.org/10.1117/12.968317

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