Computerized Wavelength Stabilized 248.4 Nm Excimer Laser For Stepper

B. Ruckle; P. Lokai; H. Rosenkranz; B. Nikolaus; H. J. Kahlert; B. Burghardt; D. Basting; W. Muckenheim

doi:10.1117/12.968444

1 January 1988 Computerized Wavelength Stabilized 248.4 Nm Excimer Laser For Stepper

B. Ruckle, P. Lokai, H. Rosenkranz, B. Nikolaus, H. J. Kahlert, B. Burghardt, D. Basting, W. Muckenheim

Proceedings Volume 0922, Optical/Laser Microlithography; (1988) https://doi.org/10.1117/12.968444
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

A single stage excimer laser for UV microlithography has been developed. It emits 2 Watt average power at about 248.4 nm with a bandwidth of 0.5 cm -1. A novel computer-controlled feedback circuitry provides for automatic stabilization of both average power and integrated bandwidth. In addition, a computer-controlled frequency stabilization unit makes that new laser ready for industrial use as light source in deep UV microlithography.

Citation Download Citation

B. Ruckle, P. Lokai, H. Rosenkranz, B. Nikolaus, H. J. Kahlert, B. Burghardt, D. Basting, and W. Muckenheim "Computerized Wavelength Stabilized 248.4 Nm Excimer Laser For Stepper", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); https://doi.org/10.1117/12.968444

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