Effect Of Temporal And Spatial Coherence Of Light Source On Patterning Characteristics In KrF Excimer Laser Lithography

Yoshiharu Ozaki; Kiichi Takamoto; Akira Yoshikawa

doi:10.1117/12.968443

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1 January 1988 Effect Of Temporal And Spatial Coherence Of Light Source On Patterning Characteristics In KrF Excimer Laser Lithography

Yoshiharu Ozaki, Kiichi Takamoto, Akira Yoshikawa

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Proceedings Volume 0922, Optical/Laser Microlithography; (1988) https://doi.org/10.1117/12.968443
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

Interference patterns are produced by point light sources originating from an optical integrator. Influence of laser light coherence on interference pattern contrast is examined analytically and experimentally. The contrast is independent of temporal coherence and dependent on spatial coherence. The modulus of the complex coherence factor remains between 0.35 and 0.55 for the number of transverse modes between 30 and 240. The interference pattern can be eliminated by rotating the optical integrator. Resolution dependence on spectral bandwidth is experimentally examined using an NA=0.42 non-achromatic projection lens. Dependence of lens resolution on spectral bandwidth is greater than that estimated from MTF curve.

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Yoshiharu Ozaki, Kiichi Takamoto, and Akira Yoshikawa "Effect Of Temporal And Spatial Coherence Of Light Source On Patterning Characteristics In KrF Excimer Laser Lithography", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); https://doi.org/10.1117/12.968443

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