Masks For Sub - 0.5Âµm Optical Lithography

Steve K Dunbrack

doi:10.1117/12.968396

1 January 1988 Masks For Sub - 0.5µm Optical Lithography

Steve K Dunbrack

Proceedings Volume 0922, Optical/Laser Microlithography; (1988) https://doi.org/10.1117/12.968396
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

A significant departure from traditional ways of viewing mask quality will be necessary in order to have a viable mask manufacturing technology for sub - 0.5um optical lithography. It will be necessary to evaluate mask performance in the context of the overall IC manufacturing process. This paper will look at the limitations of present state-of-the-art mask specifications and suggest that a new approach to mask verification is needed. Instead of making apriori and somewhat arbitrary decisions about what masks need to look like, we must have a method of determining which mask errors are of concern and which are not. Ultimately, we can exploit our mask technology to compensate for errors created by our IC manufacturing process.

Citation Download Citation

Steve K Dunbrack "Masks For Sub - 0.5µm Optical Lithography", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); https://doi.org/10.1117/12.968396

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