Polarization Dependence Of Diffraction By High Resolution Masks

William E. Haller; Andrew R. Neureuther

doi:10.1117/12.968410

1 January 1988 Polarization Dependence Of Diffraction By High Resolution Masks

William E. Haller, Andrew R. Neureuther

Proceedings Volume 0922, Optical/Laser Microlithography; (1988) https://doi.org/10.1117/12.968410
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

Diffraction by small open lines in chrome (slits) has been measured and the data compared to scalar diffraction theory. The measurement system consists of a chopped HeNe laser illumination, a mask held by a translational and rotational stage, and a photomultiplier tube on a revolving arm connected to a lock-in amplifier under the control of an IBM PC XT computer. Results for slits down to a wavelength in size show transmission nearly proportional to slit size and only slight polarization effects. Initial plots of total transmitted power divided by slit size showed a decrease for small slits. However, correcting for mask bias and/or edge roughness shows agreement with rigorous electromagnetic theory.

Citation Download Citation

William E. Haller and Andrew R. Neureuther "Polarization Dependence Of Diffraction By High Resolution Masks", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); https://doi.org/10.1117/12.968410

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available