Paper
1 January 1988 Submicron Imaging Capabilities Of A 0.40 NA Broadband Optical System
H. M. Nishimoto, E. Tai, R. J. Naber, J. F. Chen, A. Nalamwar
Author Affiliations +
Abstract
The submicron resolution capabilities, depth of focus, critical dimension control, and process latitude of a 1:1 0.40 NA lens using some of the newer high contrast resists were studied. Over the 3.5 cm2 field size the lens resolved 0.6 microns with a 0.8 to 1.6μ depth of focus. The depth of focus for 0.7μ features was found to range between 1.6 to 2.0μ. Resolution of 0.5μ with a 1.0μ depth of focus was achieved over a limited field size. The critical dimension measurements show that through focus 98% of the data stays within ±10% of the measured feature size. This critical dimension control and the improvement in resolution to 0.6 microns across the field indicates that the practical resolution of the lens can be better predicted by using 0.7 λ/NA. The application of this lower practical linewidth size to space-bandwidth-product was demonstrated.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. M. Nishimoto, E. Tai, R. J. Naber, J. F. Chen, and A. Nalamwar "Submicron Imaging Capabilities Of A 0.40 NA Broadband Optical System", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); https://doi.org/10.1117/12.968428
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KEYWORDS
Image resolution

Process control

Imaging systems

Control systems

Critical dimension metrology

Lens design

Combined lens-mirror systems

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