Through-The-Lens Automatic Focusing And Leveling In An Advanced Mask Stepper

J. H. Burbo

doi:10.1117/12.968401

1 January 1988 Through-The-Lens Automatic Focusing And Leveling In An Advanced Mask Stepper

J. H. Burbo

Proceedings Volume 0922, Optical/Laser Microlithography; (1988) https://doi.org/10.1117/12.968401
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

Design, mechanization and performance of a through-the-lens focus control system now in use by the mask-making facility at the IBM Essex Junction facility on their most advanced step-and-repeat cameras are discussed.

Citation Download Citation

J. H. Burbo "Through-The-Lens Automatic Focusing And Leveling In An Advanced Mask Stepper", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); https://doi.org/10.1117/12.968401

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