Microlithography Using A Laser Plasma Created X-Ray Source

M Chaker; B Lafontaine; J C Kieffer; P P Mercier; H Pepin; J Bernard; D Villeneuve; H Baldis; J F Currie; I Toubhans

doi:10.1117/12.945629

14 June 1988 Microlithography Using A Laser Plasma Created X-Ray Source

M Chaker, B Lafontaine, J C Kieffer, P P Mercier, H Pepin, J Bernard, D Villeneuve, H Baldis, J F Currie, I Toubhans

Proceedings Volume 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII; (1988) https://doi.org/10.1117/12.945629
Event: Medical Imaging II, 1988, Newport Beach, CA, United States

Abstract

Laser produced plasmas are investigated both theoretically and experimentally with respect to their suitability as X-ray lithography sources. We find that a minimum of 100 W average laser power is required for an acceptable wafer throughput (36 6 in. wafer/h). In addition, the optimization of the X-ray conversion efficiency in the keV range (0.75-2 keV) necessitates a laser intensity greater than 1 x 1013 W cm^-2 and a judicious choice of target atomic number. We also describe a simulation program called XLIMLAS which can be used, for instance, to determine the laser conditions which maximize the energy deposited in the resist by matching the X-ray spectrum to the wavelength dependent mask substrate transmission and to the resist absorption. Moreover, this optimisation must ensure a high quality of the resist line edge profiles. Finally, we present some experimental results on sensitivity and patternability of FBM120 resist.

Citation Download Citation

M Chaker, B Lafontaine, J C Kieffer, P P Mercier, H Pepin, J Bernard, D Villeneuve, H Baldis, J F Currie, and I Toubhans "Microlithography Using A Laser Plasma Created X-Ray Source", Proc. SPIE 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII, (14 June 1988); https://doi.org/10.1117/12.945629

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