We show that a new definition of the Mask Error Factor needs to be used in order to describe correctly the property introduced by the anamorphic optics. Moreover, for both 1-Dimensional (1D) and 2-Dimensional (2D) features the reticle writing error in the low demagnification direction X is more critical than the error in high demagnification direction Y. The effects of the change in demagnification on imaging are described on an elementary case, and are ultimately linked to the basic physical phenomenon of diffraction. |
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CITATIONS
Cited by 2 scholarly publications.
Photomasks
Nanoimprint lithography
Semiconducting wafers
Reticles
Extreme ultraviolet
Reflectivity
Lithography