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21 March 1989 High Resolution Phase Measuring Laser Interferometric Microscope For Engineering Surface Metrology
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Proceedings Volume 1009, Surface Measurement and Characterization; (1989)
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany
A new three-dimensional, non-contact laser interferometric microscope is described which uses computerized phase measuring interferometry to achieve sub-nanometer vertical resolution. Areas profiled range from 7.8mm x 5.7mm to 0.078mm x 0.057mm with a pixel sampling interval ranging from 27.0μm down to 0.27μm. Test surface reflectivity can range from less than 1% up to 100%. Turret mounted, parfocal coherent illumination (Fizeau) and incoherent illumination (Mirau) interferometric objectives permit rapid magnification change. Laser illumination coupled with selectable incoherent and coherent illumination allows variable interference fringe ranges from a few microns to millimeters length allowing rapid fringe acquisition and measurement flexibility. Tip and tilt of the entire instrument head about the plane of the test surface eliminates feature walk off from the field of view at high magnifications. Three dimensional surface plots plus user selectable two dimensional profiles extracted from three dimensional data are displayed. Two dimensional autocovariance and spectral density analysis is available. Numeric output includes rms, Ra, peak-valley, and radius of curvature. A track-ball directed interactive cursor scans analyzed data to give single pixel coordinates relative to a user defined origin.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. F. Biegen and R. A. Smythe "High Resolution Phase Measuring Laser Interferometric Microscope For Engineering Surface Metrology", Proc. SPIE 1009, Surface Measurement and Characterization, (21 March 1989);

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