Presentation + Paper
20 February 2017 Sub-wavelength gratings for mid-infrared wavlength range around 10 microns
Author Affiliations +
Proceedings Volume 10113, High Contrast Metastructures VI; 101130D (2017) https://doi.org/10.1117/12.2251937
Event: SPIE OPTO, 2017, San Francisco, California, United States
Abstract
A new material pairing is presented for the realisation of sub-wavelength graings in this work and has been used to realise high contrast gratings which operate at wavelengths of 10 μm and greater. The chosen material pairing overcomes the absorption issue which prevents the popular Si/SiO2 pairing from being useful at wavelengths above 6 μm. The obstacles that exist with the currently used grating materials for this wavelength range are described and it is outlined how the chosen materials overcome these issues. It is numerically demonstrated that gratings utilising these materials are capable of wideband high reflectivity. The gratings were fabricated using standard optical photolithography only and it is shown experimentally that the spectral response of gratings which were fabricated show good agreement with theoretically predicted performance
Conference Presentation
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Brian Hogan, Stephen P. Hegarty, Liam Lewis, Javier Romero Vivas, Tomasz Ochalski, and Guillaume Huyet "Sub-wavelength gratings for mid-infrared wavlength range around 10 microns", Proc. SPIE 10113, High Contrast Metastructures VI, 101130D (20 February 2017); https://doi.org/10.1117/12.2251937
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KEYWORDS
Reflectivity

Germanium

Refractive index

Etching

Optical lithography

Reflectors

Lithography

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