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10 March 1989 In-Situ Optical Monitoring Of Thin Film Deposition
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Proceedings Volume 1012, In-Process Optical Measurements; (1989) https://doi.org/10.1117/12.949322
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany
Abstract
Real time in-situ optical measurements play a vital role in the monitoring and control of thin film deposition and etching. Techniques include single and multiwavelength monitoring of the reflectance and/or transmittance of the coating substrate, in-situ ellipsometry, and spectroscopic diagnostics of the vapour species. This paper will review these techniques and examine recent trends.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. P. Netterfield, P. J. Martin, and K. H. Muller "In-Situ Optical Monitoring Of Thin Film Deposition", Proc. SPIE 1012, In-Process Optical Measurements, (10 March 1989); https://doi.org/10.1117/12.949322
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