Fabrication of the new structure 980nm VCSEL

Yuan Feng; Guojun Liu; Yongqin Hao; Changling Yan; Jiabin Zhang; Yang Li; Zaijin Li

doi:10.1117/12.2257053

7 November 2016 Fabrication of the new structure 980nm VCSEL

Yuan Feng, Guojun Liu, Yongqin Hao, Changling Yan, Jiabin Zhang, Yang Li, Zaijin Li

Proceedings Volume 10141, Selected Papers of the Chinese Society for Optical Engineering Conferences held July 2016; 101410H (2016) https://doi.org/10.1117/12.2257053
Event: Selected Proceedings of the Chinese Society for Optical Engineering Conferences held July 2016, 2016, Changchun, China

Abstract

In this paper, the new structure of 980nm VCSEL was designed and fabricated in order to improve thermal problem and photo-electricity characteristic. From the point of view reduced equivalent resistance, P-side electrode was designed as intra-cavity contact structure. The VCSEL with conventional flip bottom emission structure and intra-cavity contact structure have been fabricated with the same aperture and tested comparatively. the new structure has a differential resistance of 21Ω, but the conventional structure has a differential resistance of 25.5Ω. The tested results showed that this new-type structure VCSEL is expected to improve the thermal characteristics of the device and the opto-electric characteristics.

Citation Download Citation

Yuan Feng, Guojun Liu, Yongqin Hao, Changling Yan, Jiabin Zhang, Yang Li, and Zaijin Li "Fabrication of the new structure 980nm VCSEL", Proc. SPIE 10141, Selected Papers of the Chinese Society for Optical Engineering Conferences held July 2016, 101410H (7 November 2016); https://doi.org/10.1117/12.2257053

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